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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 27 — Sep. 20, 1997
  • pp: 6852–6856

Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching

Junji Nishii and Hiroshi Yamanaka  »View Author Affiliations


Applied Optics, Vol. 36, Issue 27, pp. 6852-6856 (1997)
http://dx.doi.org/10.1364/AO.36.006852


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Abstract

Photon-induced property changes of sputter-deposited GeO2–SiO2 thin glass films were investigated. Irradiation with ArF laser pulses induced the changes in refractive index of -10% and volume of +30% in the film without ablation. A Bragg grating with a positive sinusoid wave pattern was printed upon the film by irradiation with ArF excimer laser pulses through a phase mask. The irradiated area could be quickly etched by a HF solution. The ratio of etching rate of irradiated area to unirradiated area was higher than 30. A Bragg grating with a surface relief pattern was successfully formed on the film by irradiation with excimer laser pulses followed by chemical etching. Diffraction efficiency of the gratings increased by 25 times with the etching.

© 1997 Optical Society of America

History
Original Manuscript: September 18, 1996
Revised Manuscript: February 19, 1997
Published: September 20, 1997

Citation
Junji Nishii and Hiroshi Yamanaka, "Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching," Appl. Opt. 36, 6852-6856 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-27-6852


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References

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