OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 36, Iss. 27 — Sep. 20, 1997
  • pp: 6852–6856

Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching

Junji Nishii and Hiroshi Yamanaka  »View Author Affiliations

Applied Optics, Vol. 36, Issue 27, pp. 6852-6856 (1997)

View Full Text Article

Enhanced HTML    Acrobat PDF (788 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Photon-induced property changes of sputter-deposited GeO2–SiO2 thin glass films were investigated. Irradiation with ArF laser pulses induced the changes in refractive index of -10% and volume of +30% in the film without ablation. A Bragg grating with a positive sinusoid wave pattern was printed upon the film by irradiation with ArF excimer laser pulses through a phase mask. The irradiated area could be quickly etched by a HF solution. The ratio of etching rate of irradiated area to unirradiated area was higher than 30. A Bragg grating with a surface relief pattern was successfully formed on the film by irradiation with excimer laser pulses followed by chemical etching. Diffraction efficiency of the gratings increased by 25 times with the etching.

© 1997 Optical Society of America

Original Manuscript: September 18, 1996
Revised Manuscript: February 19, 1997
Published: September 20, 1997

Junji Nishii and Hiroshi Yamanaka, "Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching," Appl. Opt. 36, 6852-6856 (1997)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, J. Albert, “Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask,” Appl. Phys. Lett. 62, 1035–1037 (1993). [CrossRef]
  2. B. Poumellec, P. Guenot, I. Riant, P. Sansonetti, P. Niay, P. Bernag, J. F. Bayon, “UV induced densification during Bragg grating inscription in Ge:SiO2 preforms,” Opt. Mater. 4, 441–449 (1995). [CrossRef]
  3. P. Cordier, J. C. Doukhan, E. Fertein, P. Bernage, P. Niay, J. F. Bayon, T. Georges, “TEM characterization of structural changes in glass associated to Bragg grating inscription in a germanosilicate optical fiber preform,” Opt. Commun. 111, 269–275 (1994). [CrossRef]
  4. P. St. Russell, D. P. Hand, “Photoinduced refractive-index changes in germanosilicate fibers,” Opt. Lett. 15, 102–104 (1990). [CrossRef]
  5. J. Nishii, K. Fukumi, H. Yamanaka, H. Hosono, H. Kawazoe, “Photochemical reactions in GeO2–SiO2 glasses induced by ultraviolet irradiation: comparison between Hg lamp and excimer laser,” Phys. Rev. B 52, 1661–1665 (1995). [CrossRef]
  6. J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, “Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2–SiO2 glasses,” Opt. Lett. 20, 1184–1186 (1995). [CrossRef] [PubMed]
  7. H. Hosono, H. Kawazoe, J. Nishii, “Defect formation in SiO2:GeO2 glasses by irradiation with excimer laser light,” Phys. Rev. B 53, R11,921–R11,923 (1996). [CrossRef]
  8. E. J. Friebele, D. L. Griscom, “Color centers in glass optical fiber waveguides,” Mater. Res. Soc. Symp. Proc. 61, 319–331 (1985). [CrossRef]
  9. H. Hosono, M. Mizuguchi, H. Kawazoe, J. Nishii, “Correlation between GeE′ centers and optical absorption bands in SiO2:GeO2 glasses,” Jpn. J. Appl. Phys. 35, L234–236 (1996). [CrossRef]
  10. K. D. Simmoms, G. I. Stegeman, B. G. Potter, J. H. Simmons, “Photosensitivity of solgel-derived germanosilicate planar waveguides,” Opt. Lett. 18, 25–27 (1993). [CrossRef]
  11. J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, R. Leonelli, “Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching,” Opt. Lett. 17, 23–25 (1992). [CrossRef]
  12. J. Nishii, A. Chayahara, K. Fukumi, K. Fujii, H. Yamanaka, H. Hosono, H. Kawazoe, “Comparison of formation process of ultraviolet induced color centers in GeO2–SiO2 glass fiber preform and Ge-implanted SiO2,” Nucl. Instrum. Methods B 116, 150–153 (1996). [CrossRef]
  13. J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Characteristics of 5-eV absorption band in sputter deposited GeO2–SiO2 thin glass films,” Appl. Phys. Lett. 64, 282–284 (1994). [CrossRef]
  14. J. Nishii, H. Yamanaka, H. Hosono, H. Kawazoe, “Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer laser irradiation,” Opt. Lett. 21, 1360–1362 (1996). [CrossRef] [PubMed]
  15. H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, H. Kawazoe, “Nature and origin of the 5-eV band in SiO2:GeO2 glasses,” Phys. Rev. B 46, 11,445–11,451 (1992). [CrossRef]
  16. R. A. B. Devine, “Ion implantation- and radiation-induced structural modifications in amorphous SiO2,” J. Non-Cryst. Solids 152, 50–58 (1993). [CrossRef]
  17. N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita, M. Kinoshita, “Refractive index of densified silica glass,” J. Non-Cryst. Solids 159, 241–245 (1993). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


Fig. 1 Fig. 2 Fig. 3
Fig. 4 Fig. 5

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited