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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 28 — Oct. 1, 1997
  • pp: 7157–7161

Effects of phase changes on reflection and their wavelength dependence in optical profilometry

Takuma Doi, Kouji Toyoda, and Yoshihisa Tanimura  »View Author Affiliations


Applied Optics, Vol. 36, Issue 28, pp. 7157-7161 (1997)
http://dx.doi.org/10.1364/AO.36.007157


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Abstract

The method as well as an appropriate instrumentation for measuring phase changes of reflected light is described. The phase changes on samples of Au, Al, Ag, and Cr evaporated films are measured for five wavelengths (λ) from 442 to 633 nm, with respect to the phase change at the glass–air interface, where it should be zero. The measured results for the Au film are in fairly good agreement with values calculated by use of optical constants from a handbook or the complex refractive index measured by an ellipsometer. The phase changes for Al and Ag films are different from calculated values by ~5° or a shift length of 4.4 nm at λ = 633 nm, while those of the Cr film show large shifts as high as 16° or a shift length of 9.8 nm at λ = 442 nm.

© 1997 Optical Society of America

[Optical Society of America ]

Citation
Takuma Doi, Kouji Toyoda, and Yoshihisa Tanimura, "Effects of phase changes on reflection and their wavelength dependence in optical profilometry," Appl. Opt. 36, 7157-7161 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-28-7157

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