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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 10 — Apr. 1, 1998
  • pp: 1895–1902

Polarization analyses of aerial images produced by an optical lithography system

Yasuyuki Unno  »View Author Affiliations


Applied Optics, Vol. 37, Issue 10, pp. 1895-1902 (1998)
http://dx.doi.org/10.1364/AO.37.001895


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Abstract

The influence of polarization on the image formation of one-dimensional periodic patterns in a projection optical lithography system has been investigated. Assuming a linear polarizer at the lens pupil, I derived a simple expression representing the image intensity as the summation over spatial-frequency harmonics as well as three orthogonal polarizations. I calculated the coefficient for each image component as a function of the pattern frequency by independently varying the degree of partial coherence such that the image qualities of the two extreme polarization cases could be thoroughly compared.

© 1998 Optical Society of America

OCIS Codes
(110.2990) Imaging systems : Image formation theory
(110.5220) Imaging systems : Photolithography
(260.5430) Physical optics : Polarization

History
Original Manuscript: August 4, 1997
Revised Manuscript: November 10, 1997
Published: April 1, 1998

Citation
Yasuyuki Unno, "Polarization analyses of aerial images produced by an optical lithography system," Appl. Opt. 37, 1895-1902 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-10-1895

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