The influence of polarization on the image formation of one-dimensional periodic patterns in a projection optical lithography system has been investigated. Assuming a linear polarizer at the lens pupil, I derived a simple expression representing the image intensity as the summation over spatial-frequency harmonics as well as three orthogonal polarizations. I calculated the coefficient for each image component as a function of the pattern frequency by independently varying the degree of partial coherence such that the image qualities of the two extreme polarization cases could be thoroughly compared.
© 1998 Optical Society of America
Original Manuscript: August 4, 1997
Revised Manuscript: November 10, 1997
Published: April 1, 1998
Yasuyuki Unno, "Polarization analyses of aerial images produced by an optical lithography system," Appl. Opt. 37, 1895-1902 (1998)