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Applied Optics

Applied Optics


  • Vol. 37, Iss. 12 — Apr. 20, 1998
  • pp: 2242–2244

Photosensitivity in silica-based waveguides deposited by atmospheric pressure chemical vapor deposition

Takashi Saito, Tadahiko Hanada, Naoki Kitamura, and Mitsuhiro Kitamura  »View Author Affiliations

Applied Optics, Vol. 37, Issue 12, pp. 2242-2244 (1998)

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By using a Mach–Zehnder interferometer, we evaluated photosensitivity in silica-based waveguides deposited by atmospheric pressure vapor deposition. Our results show that photosensitivity with ArF excimer laser irradiation was ten times greater than photosensitivity with KrF excimer laser irradiation. ArF excimer laser irradiation induced a refractive-index change of greater than 2 × 10-3 at 1.55 μm and a birefringence between TE and TM modes of less than 6 × 10-5. It has also been determined that the photoinduced absorption change of 90 dB/mm at 210 nm cannot account for a refractive-index change greater than 10-3.

© 1998 Optical Society of America

OCIS Codes
(010.0010) Atmospheric and oceanic optics : Atmospheric and oceanic optics
(130.0130) Integrated optics : Integrated optics
(160.6030) Materials : Silica
(230.7370) Optical devices : Waveguides
(260.7190) Physical optics : Ultraviolet

Original Manuscript: July 8, 1997
Revised Manuscript: November 6, 1997
Published: April 20, 1998

Takashi Saito, Tadahiko Hanada, Naoki Kitamura, and Mitsuhiro Kitamura, "Photosensitivity in silica-based waveguides deposited by atmospheric pressure chemical vapor deposition," Appl. Opt. 37, 2242-2244 (1998)

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