Polarizing Mirror/Absorber for Visible Wavelengths Based on a Silicon Subwavelength Grating: Design and Fabrication
Applied Optics, Vol. 37, Issue 13, pp. 2534-2541 (1998)
http://dx.doi.org/10.1364/AO.37.002534
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Abstract
A one-dimensional 280-nm period silicon grating designed to exhibitpolarization-dependent reflection or antireflection behavior at visiblewavelengths has been fabricated and tested. For normally incident575-nm light, this grating reflects less than 3% of the incidentradiation polarized perpendicular to the grating grooves andapproximately 23% of the orthogonal polarization. To demonstratethe grating’s broadband characteristics, reflectance measurements arepresented over the free-space wavelength range 475 nm < λ0 < 800 nm, for angles of incidence in the range 0° < θ < 40°, for polarization parallel and perpendicular to thegrating grooves, and for planes of incidence parallel and perpendicularto the grooves. A description of the fabrication process is alsogiven.
© 1998 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(260.5430) Physical optics : Polarization
(310.1210) Thin films : Antireflection coatings
Citation
David L. Brundrett, Thomas K. Gaylord, and Elias N. Glytsis, "Polarizing Mirror/Absorber for Visible Wavelengths Based on a Silicon Subwavelength Grating: Design and Fabrication," Appl. Opt. 37, 2534-2541 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-13-2534
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