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Applied Optics

Applied Optics


  • Vol. 37, Iss. 13 — May. 1, 1998
  • pp: 2681–2686

Preparation of optical quality ZnCdTe thin films by vacuum evaporation

Raoul Weil, Marguerite Joucla, Jean Luc Loison, Michaël Mazilu, Dominique Ohlmann, Michèle Robino, and Georges Schwalbach  »View Author Affiliations

Applied Optics, Vol. 37, Issue 13, pp. 2681-2686 (1998)

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A procedure to make optical quality thin films of Zn x Cd1-x Te by use of vacuum evaporation of the ternary compound has been developed. The starting point was the preparation of the compound that was then used as the source in a simple vacuum evaporation system. The characteristics of a film containing 85% ZnTe (x = 0.85) are presented. Electron microscope, atomic force microscope, x-ray and optical spectral measurements were made. The index of refraction was determined at room temperature from transmittance measurements in the range of from 580 to 800 nm and was found to agree within 1% with values found by others for single crystals. We did this by assuming a Sellmeier equation and a known index of refraction at infinite wavelength. The calculation also yielded the roughness of the film.

© 1998 Optical Society of America

OCIS Codes
(140.5960) Lasers and laser optics : Semiconductor lasers
(160.4760) Materials : Optical properties
(310.0310) Thin films : Thin films

Original Manuscript: June 9, 1997
Revised Manuscript: January 6, 1998
Published: May 1, 1998

Raoul Weil, Marguerite Joucla, Jean Luc Loison, Michaël Mazilu, Dominique Ohlmann, Michèle Robino, and Georges Schwalbach, "Preparation of optical quality ZnCdTe thin films by vacuum evaporation," Appl. Opt. 37, 2681-2686 (1998)

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