We have performed angle-dependent reflectance measurements of <i>in situ</i> magnetron sputtered films of B<sub>4</sub>C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35–150 eV. In the cases of Si, C, and B<sub>4</sub>C we found excellent agreement with published data. However, for Mo and W we found that the optical properties from 35 to 60 eV differed significantly from those in the literature.
[Optical Society of America ]
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(120.5700) Instrumentation, measurement, and metrology : Reflection
(300.6250) Spectroscopy : Spectroscopy, condensed matter
(300.6540) Spectroscopy : Spectroscopy, ultraviolet
Charles Tarrio, Richard N. Watts, Thomas B. Lucatorto, Jon M. Slaughter, and Charles M. Falco, "Optical Constants of In Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials," Appl. Opt. 37, 4100-4104 (1998)