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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 19 — Jul. 1, 1998
  • pp: 4254–4259

Attenuated phase-shifting masks of chromium aluminum oxide

Eunah Kim, Seungbum Hong, Sungchul Lim, Yong-Beom Kim, Sang-Gyun Woo, Dae-Weon Kim, and Kwangsoo No  »View Author Affiliations


Applied Optics, Vol. 37, Issue 19, pp. 4254-4259 (1998)
http://dx.doi.org/10.1364/AO.37.004254


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Abstract

Chromium aluminum oxide was chosen as a new candidate for use as an attenuated phase-shifting mask (Att-PSM) material. The compositions of films were correlated with optical properties. With the measured and the fitted data, we simulated the transmittance and the phase shift using the matrix method. Consequently, we acquired optimum parameters for Att-PSM’s, such as Al/Cr = 1.9–2.5 and d = 120 nm at a 193-nm wavelength, Al/Cr = 1.0–1.7 and d = 128 nm at a 248-nm wavelength, and Al/Cr = 0–0.1 and d = 170 nm at a 365-nm wavelength. This simulation was verified by transmittance measurement.

© 1998 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization

History
Original Manuscript: November 3, 1997
Revised Manuscript: March 9, 1998
Published: July 1, 1998

Citation
Eunah Kim, Seungbum Hong, Sungchul Lim, Yong-Beom Kim, Sang-Gyun Woo, Dae-Weon Kim, and Kwangsoo No, "Attenuated phase-shifting masks of chromium aluminum oxide," Appl. Opt. 37, 4254-4259 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-19-4254

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