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Applied Optics

Applied Optics


  • Vol. 37, Iss. 2 — Jan. 10, 1998
  • pp: 369–373

One-Dimensional Antireflection Gratings in (100) Silicon: A Numerical Study

Mark Auslender, David Levy, and Shlomo Hava  »View Author Affiliations

Applied Optics, Vol. 37, Issue 2, pp. 369-373 (1998)

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The antireflection properties of V-grooved gratings in (100)crystalline silicon are studied numerically by use of rigorouselectromagnetic theory. This study shows that these gratings canexhibit antireflective behavior only for TM-polarizedradiation. The V-grooved structures are analyzed as a function ofgrating period, duty cycle, and depth of a SiO<sub>2</sub> mask layerthat is added to the tops of the V-grooved mesas. Specificantireflection grating designs (the duty cycle and depth versus theperiod) are presented that illustrate TM-polarized reflectivity muchless than 10<sup>−3</sup> with periods as high as 80% the wavelengthof incident radiation. These designs exhibit good tolerance tofabrication errors and grating’s plane deviations in aplanar-diffraction mounting.

© 1998 Optical Society of America

OCIS Codes
(040.6040) Detectors : Silicon
(050.1950) Diffraction and gratings : Diffraction gratings
(260.2110) Physical optics : Electromagnetic optics
(310.1210) Thin films : Antireflection coatings

Mark Auslender, David Levy, and Shlomo Hava, "One-Dimensional Antireflection Gratings in (100) Silicon: A Numerical Study," Appl. Opt. 37, 369-373 (1998)

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