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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 22 — Aug. 1, 1998
  • pp: 5112–5115

Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures

Babar K. Minhas, Stephen A. Coulombe, S. Sohail H. Naqvi, and John R. McNeil  »View Author Affiliations


Applied Optics, Vol. 37, Issue 22, pp. 5112-5115 (1998)
http://dx.doi.org/10.1364/AO.37.005112


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Abstract

We describe a modification to our existing scatterometry technique for extracting the relative phase and amplitude of the electric field diffracted from a grating. This modification represents a novel combination of aspects of ellipsometry and scatterometry to provide improved sensitivity to small variations in the linewidth of subwavelength gratings compared with conventional scatterometer measurements. We present preliminary theoretical and experimental results that illustrate the possibility of the ellipsometric scatterometry technique providing a metrology tool for characterizing sub-0.1-μm-linewidth.

© 1998 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1960) Diffraction and gratings : Diffraction theory
(050.2770) Diffraction and gratings : Gratings
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements

History
Original Manuscript: November 5, 1997
Revised Manuscript: March 27, 1998
Published: August 1, 1998

Citation
Babar K. Minhas, Stephen A. Coulombe, S. Sohail H. Naqvi, and John R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-22-5112


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References

  1. S. S. H. Naqvi, J. R. McNeil, R. H. Krukar, K. P. Bishop, “Scatterometry and the simulation of diffraction-based metrology,” Microlithogr. World 2(3), 5–16 (1993).
  2. C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. W. Hosch, J. R. McNeil, “Multiparameter grating metrology using optical scatterometry,” J. Vacuum Sci. Technol. B 15, 361–368 (1997). [CrossRef]
  3. The National Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, Calif., 1994).
  4. B. K. Minhas, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, “Toward sub-0.1-μm CD measurements using scatterometry,” in Integrated Circuit Metrology, Inspection, and Process Control X, S. K. Jones, ed., Proc. SPIE2725, 729–739 (1996).
  5. S. A. Coulombe, B. K. Minhas, C. J. Raymond, S. S. H. Naqvi, J. R. McNeil, “Scatterometry measurement of sub-0.1-μm linewidth gratings,” submitted to J. Vacuum Sci. Technol. B (1998).
  6. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light. (North-Holland, Amsterdam, 1977).
  7. J. R. Beattie, “Optical constants of metals in the infra-red—experimental methods,” Philos. Mag. 46, 235–245 (1955).
  8. E. Collett, Polarized Light—Fundamentals and Applications (Marcel Dekker, New York, 1993).
  9. M. G. Moharam, T. K. Gaylord, “Three-dimensional vector coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am. 73, 1105–1112 (1983). [CrossRef]
  10. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vacuum Sci. Technol. B 13, 1484–1495 (1995). [CrossRef]

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