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Applied Optics

Applied Optics


  • Vol. 37, Iss. 25 — Sep. 1, 1998
  • pp: 5912–5922

Standards for which the ellipsometric parameter Ψ remains insensitive to variations in the angle of incidence

Stoyan C. Russev, Jean-Pierre Drolet, and Daniel Ducharme  »View Author Affiliations

Applied Optics, Vol. 37, Issue 25, pp. 5912-5922 (1998)

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We examine the possibility of using two- and three-phase systems suitable as standards for which the ellipsometric parameter Ψ remains insensitive to variations in the angle of incidence. These standards avoid propagation of errors in the angle of incidence with respect to the measured standard Ψ value. Different materials (dielectrics, metals, and semiconductors), adequate for the above purpose, are considered in different structure combinations, and their optical response are analyzed.

© 1998 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4800) Instrumentation, measurement, and metrology : Optical standards and testing

Original Manuscript: February 2, 1998
Published: September 1, 1998

Stoyan C. Russev, Jean-Pierre Drolet, and Daniel Ducharme, "Standards for which the ellipsometric parameter Ψ remains insensitive to variations in the angle of incidence," Appl. Opt. 37, 5912-5922 (1998)

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  1. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).
  2. T. Yasuda, D. E. Aspnes, “Optical-standard surfaces of single-crystal silicon for calibrating ellipsometers and reflectometers,” Appl. Opt. 33, 7435–7438 (1994). [CrossRef] [PubMed]
  3. D. P. Arndt, R. M. A. Azzam, J. M. Bennett, J. P. Borgongo, C. K. Carniglia, W. E. Case, J. A. Dobrowolski, U. J. Gibson, T. Tuttle Hart, F. C. Ho, V. A. Hodgkin, W. P. Klapp, H. A. Macleod, E. Pelletier, M. K. Parvis, D. M. Quinn, D. H. Strome, R. Swenson, P. A. Temple, T. F. Thonn, “Multiple determination of the optical constants of thin film coating materials,” Appl. Opt. 23, 3571–3596 (1984). [CrossRef] [PubMed]
  4. J. Vanhellemont, H. E. Maes, M. Schaekers, A. Armigliato, H. Cerva, A. Cullis, J. de Sande, H. Dinges, J. Hallais, V. Nayar, C. Pickering, J. L. Stehle, J. Van Landuyt, C. Walker, H. Werner, P. Salieri, “Round robin investigations of silicon oxide on silicon reference materials for ellipsometry,” Appl. Surf. Sci. 63, 45–51 (1993). [CrossRef]
  5. G. A. Candela, D. Chandler-Horowitz, J. F. Marchiando, D. B. Novotny, B. J. Belzer, M. C. Croarkin, Standard Reference Materials: Preparation and Certification of SRM-2530, Ellipsometric Parameters and Derived Thickness and Refractive Index of a Silicon Dioxide Layer on Silicon, NIST Spec. Publ. (National Institute of Standards and Technology, Gaithersburg, Md., 1988), 260–109.
  6. Standard Reference Material 2530 Series, available from the National Institute of Standards and Technology, Gaithersburg, Md. 20899.
  7. S. S. So, W. H. Knausenberger, K. Vedam, “Importance of the accuracy of setting the angle of incidence in ellipsometric measurements on surfaces immersed in liquids,” J. Opt. Soc. Am. 61, 124–126 (1971). [CrossRef]
  8. J. R. Zeidler, R. B. Kochles, N. M. Bashara, “Sensitivity of ellipsometric parameters to angle-of-incidence variations,” Appl. Opt. 13, 8, 1938–1945 (1974). [CrossRef]
  9. V. I. Psenicin, M. I. Abaev, N. Y. Lizlov, Ellipsometry in Physicochemical Investigations (Chimia, Leningrad, 1986) (in Russian).
  10. S. Y. Kim, K. Vedam, “Analytic solution of the pseudo-Brewster angle,” J. Opt. Soc. Am. A 3, 1772–1773 (1986). [CrossRef]
  11. C. J. Dell’oca, “Properties and anodization of evaporated aluminum films studied by ellipsometry,” Thin Solid Films 26, 371–380 (1975). [CrossRef]
  12. A. V. Rjanov, Principles of Ellipsometry (Nauka, Siberian Branch, Novosibirsk, Russia1979) (in Russian).
  13. I. Ohlidal, F. Lukes, “Analysis of semiconductor surfaces with very thin native oxide layers by combined immersion and multiple angle of incidence ellipsometry,” Appl. Surf. Sci. 35, 259–273 (1988–89). [CrossRef]
  14. F. Lukes, “Ellipsometry of silicon with natural surface film at 632.8 nm,” Phys. Status Solidi A 93, 223–230 (1986). [CrossRef]
  15. F. Lukes, “Temperature dependence of ellipsometric parameters of silicon,” Phys. Status Solidi A 102, 803–814 (1987). [CrossRef]
  16. S. C. Russev, L. Vassilev, V. Vulchev, L. Lutov, Tz. Argirov, “Growth of thin Ag2S films on silver layers: in situ ellipsometric and conductivity studies,” J. Phys. Condens. Matter 6, 6237–6244 (1994). [CrossRef]
  17. D. Beaglehole, “Isoellipsometric-parameter curves for layers on silicon,” J. Opt. Soc. Am. A 8, 2, 311–313 (1991). [CrossRef]
  18. E. Palik, ed., Handbook of Optical Constant of Solids (Academic, San Diego, Calif., 1985), p. 107.
  19. D. Aspnes, A. Studna, “Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, and InSb from 1.5 to 6.0 eV,” Phys. Rev. B 27, 985–1009 (1983). [CrossRef]
  20. D. Tonova, M. Depas, J. Vanhellemont, “Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants,” Thin Solid Films 288, 64–68 (1996). [CrossRef]
  21. J. van der Meulen, N. C. Hien, “Design and operation of an automated, high-temperature ellipsometer,” J. Opt. Soc. Am. 64, 804–811 (1974). [CrossRef]
  22. P. Jellison, D. H. Lowndes, “Time-resolved ellipsometry,” Appl. Opt. 24, 2948–2955 (1985). [CrossRef] [PubMed]

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