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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 25 — Sep. 1, 1998
  • pp: 5993–6001

Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films

Monica Veszelei, Lisen Kullman, Claes G. Granqvist, Nik von Rottkay, and Mike Rubin  »View Author Affiliations


Applied Optics, Vol. 37, Issue 25, pp. 5993-6001 (1998)
http://dx.doi.org/10.1364/AO.37.005993


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Abstract

Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive dc magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both techniques being firmly connected to stoichiometric information. The optical constants n and k were evalued from spectrophotometry and from variable-angle spectroscopic ellipsometry. The two analyses gave consistent results. It was found that n for the mixed-oxide films varied smoothly between the values for the pure oxides, whereas k in the band-gap range showed characteristic differences between Ti-Ce oxide and Zr-Ce oxide. It is speculated that this difference is associated with structural effects.

© 1998 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.0310) Thin films : Thin films

History
Original Manuscript: February 2, 1998
Revised Manuscript: May 1, 1998
Published: September 1, 1998

Citation
Monica Veszelei, Lisen Kullman, Claes G. Granqvist, Nik von Rottkay, and Mike Rubin, "Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films," Appl. Opt. 37, 5993-6001 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-25-5993

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