Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive dc magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both techniques being firmly connected to stoichiometric information. The optical constants <i>n</i> and <i>k</i> were evalued from spectrophotometry and from variable-angle spectroscopic ellipsometry. The two analyses gave consistent results. It was found that <i>n</i> for the mixed-oxide films varied smoothly between the values for the pure oxides, whereas <i>k</i> in the band-gap range showed characteristic differences between Ti-Ce oxide and Zr-Ce oxide. It is speculated that this difference is associated with structural effects.
© 1998 Optical Society of America
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.0310) Thin films : Thin films
Monica Veszelei, Lisen Kullman, Claes G. Granqvist, Nik von Rottkay, and Mike Rubin, "Optical Constants of Sputter-Deposited Ti-Ce Oxide and Zr-Ce Oxide Films," Appl. Opt. 37, 5993-6001 (1998)