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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 31 — Nov. 1, 1998
  • pp: 7241–7247

Distorted wave front produced by a high-resolution projection optical system having rotationally symmetric birefringence

Yasuyuki Unno  »View Author Affiliations


Applied Optics, Vol. 37, Issue 31, pp. 7241-7247 (1998)
http://dx.doi.org/10.1364/AO.37.007241


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Abstract

The influence of birefringence caused by rotationally symmetric stress distribution in a high-resolution projection optical system is investigated. The general form of the pupil function is derived based on the Jones matrix calculation, expressing the wave front as a combination of the two orthogonal polarization components. Assuming a linearly polarized incident beam, it is found that the main polarization portion of the wave front exiting the projection lens has astigmatic aberration in the Seidel region and shows phase singularity at four pupil points at which the amplitude transmittance becomes zero.

© 1998 Optical Society of America

OCIS Codes
(110.3000) Imaging systems : Image quality assessment
(110.5220) Imaging systems : Photolithography
(260.1440) Physical optics : Birefringence
(260.5430) Physical optics : Polarization

History
Original Manuscript: March 3, 1998
Revised Manuscript: August 3, 1998
Published: November 1, 1998

Citation
Yasuyuki Unno, "Distorted wave front produced by a high-resolution projection optical system having rotationally symmetric birefringence," Appl. Opt. 37, 7241-7247 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-31-7241


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References

  1. P. Rai-Choudhury, ed., Handbook of Microlithography, Micromachining, and Microfabrication, Volume 1: Microlithography (SPIE Optical Engineering Press, Bellingham, Wash., 1997), Chap. 1.
  2. H. Shinonaga, M. Arakawa, “Stepper exposure system for the quarter-micrometer age,” in Optical Microlithography IX, G. E. Fuller, ed., Proc. SPIE.2726, 754–766 (1996). [CrossRef]
  3. K. Suzuki, S. Wakamoto, K. Nishi, “KrF step-and-scan exposure system using higher-NA projection lens,” Optical Microlithography IX, G. E. Fuller, ed., Proc. SPIE.2726, 767–779 (1996). [CrossRef]
  4. M. Rothchild, D. J. Ehrlich, D. C. Shaver, “Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica,” Appl. Phys. Lett. 55, 1276–1278 (1989). [CrossRef]
  5. R. Schenker, W. Oldham, “Effects of compaction on 193 nm lithographic system performance,” J. Vac. Sci. Technol. B 14, 3709–3713 (1996). [CrossRef]
  6. D. C. Allan, C. Smith, N. F. Borrelli, T. P. Seward, “193-nm excimer-laser-induced densification of fused silica,” Opt. Lett. 21, 1960–1962 (1996). [CrossRef] [PubMed]
  7. N. F. Borrelli, C. Smith, D. C. Allan, T. P. Seward, “Densification of fused silica under 193-nm excitation,” J. Opt. Soc. Am. B 14, 1606–1615 (1997). [CrossRef]
  8. S. M. Rekhson, “Thermal stresses, relaxation, and hysteresis in glass,” J. Am. Ceram. Soc. 76, 1113–1123 (1993). [CrossRef]
  9. R. C. Jones, “A new calculus for the treatment of optical systems. I. Description and discussion of the calculus,” J. Opt. Soc. Am. 31, 488–493 (1941). [CrossRef]
  10. W. Primak, D. Post, “Photoelastic constants of vitreous silica and its elastic coefficient,” J. Appl. Phys. 30, 779–788 (1959). [CrossRef]
  11. E. Collett, Polarized Light: Fundamentals and Applications (Marcel Dekker, New York, 1992), Chap. 10.
  12. M. Born, E. Wolf, Principles of Optics, 6th ed. (Pergamon, New York, 1980), Chaps. 5 and 9.
  13. Ref. 12, Chap. 3.
  14. D. L. Fried, J. L. Vaughn, “Branch cuts in the phase function,” Appl. Opt. 31, 2865–2882 (1992). [CrossRef] [PubMed]
  15. F. S. Roux, “Diffractive lens with a null in the center of its focal point,” Appl. Opt. 32, 4191–4192 (1993). [CrossRef] [PubMed]
  16. M. Harris, C. A. Hill, J. M. Vaughan, “Optical helices and spiral interference fringes,” Opt. Commun. 106, 161–166 (1994). [CrossRef]
  17. M. Gu, X. S. Gan, “Fresnel diffraction by a circular plane wave with optical phase singularities and its effect on the intensity distribution in the focal plane of a lens,” Optik 105, 51–56 (1997).
  18. H. Aben, J. Josepson, “Strange interference blots in the interferometry of inhomogeneous objects,” Appl. Opt. 36, 7172–7179 (1997). [CrossRef]
  19. R. Kingslake, “The interferometer patterns due to the primary aberrations,” Trans. Opt. Soc. London 27, 94–105 (1926). [CrossRef]

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