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Applied Optics

Applied Optics


  • Vol. 37, Iss. 32 — Nov. 10, 1998
  • pp: 7490–7495

Thin ferroelectric interferometer for spatial light modulations

Feiling Wang, Kewen K. Li, Vladimir Fuflyigin, Hua Jiang, Jing Zhao, Peter Norris, and Dennis Goldstein  »View Author Affiliations

Applied Optics, Vol. 37, Issue 32, pp. 7490-7495 (1998)

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Thin ferroelectric interferometers (TFI’s) for use as light-modulating devices were fabricated entirely with thin-film techniques on sapphire substrates. The ferroelectric layer in the TFI devices was a lead lanthanum zirconated titanate thin-film material, which can be formed from a chemical solution on highly reflective dielectric mirror surfaces. Light intensity modulation in both transmission and reflection modes was demonstrated with the fabricated devices. Experimental data and simulations show that TFI devices possess tremendous potential in spatial light modulators because of their fast-switching, low-driving voltage and readiness for integration with a variety of substrates, including silicon.

© 1998 Optical Society of America

OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(160.2260) Materials : Ferroelectrics
(200.4650) Optics in computing : Optical interconnects
(200.4740) Optics in computing : Optical processing
(230.4110) Optical devices : Modulators
(230.6120) Optical devices : Spatial light modulators

Original Manuscript: February 23, 1998
Revised Manuscript: May 26, 1998
Published: November 10, 1998

Feiling Wang, Kewen K. Li, Vladimir Fuflyigin, Hua Jiang, Jing Zhao, Peter Norris, and Dennis Goldstein, "Thin ferroelectric interferometer for spatial light modulations," Appl. Opt. 37, 7490-7495 (1998)

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