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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 34 — Dec. 1, 1998
  • pp: 8012–8020

Fabrication of N-level binary optical elements by use of M mask patterns with N in the range of 2 M-1 + 1 ≤ N ≤ 2 M

Yasuyuki Unno  »View Author Affiliations


Applied Optics, Vol. 37, Issue 34, pp. 8012-8020 (1998)
http://dx.doi.org/10.1364/AO.37.008012


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Abstract

Diffraction characteristics of N-level (5 ≤ N ≤ 8) binary gratings fabricated by repetition of three sets of photolithography and dry-etching processes have been investigated. After presentation of the general algorithm to determine a mask pattern and etching depth combination used in each fabrication process, all the methods for creating staircase structures with N = 5, 6, 7, 8 are derived. Then the diffraction efficiency achievable for the different level numbers, with the existence of mask alignment errors and for a fixed grating period, is compared, and it is found that an eight-level structure does not always give the best value.

© 1998 Optical Society of America

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(050.1970) Diffraction and gratings : Diffractive optics
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.1950) Optical devices : Diffraction gratings

History
Original Manuscript: August 3, 1998
Revised Manuscript: September 23, 1998
Published: December 1, 1998

Citation
Yasuyuki Unno, "Fabrication of N-level binary optical elements by use of M mask patterns with N in the range of 2M-1 + 1 ≤ N ≤ 2M," Appl. Opt. 37, 8012-8020 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-34-8012

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