Fabrication of N-Level Binary Optical Elements by Use of M Mask Patterns with N in the Range of 2M-1 + 1 ≤ N ≤ 2M
Applied Optics, Vol. 37, Issue 34, pp. 8012-8020 (1998)
http://dx.doi.org/10.1364/AO.37.008012
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Abstract
Diffraction characteristics of N-level (5 ≤ N ≤ 8) binary gratings fabricated by repetition of three sets of photolithography and dry-etching processes have been investigated. After presentation of the general algorithm to determine a mask pattern and etching depth combination used in each fabrication process, all the methods for creating staircase structures with N = 5, 6, 7, 8 are derived. Then the diffraction efficiency achievable for the different level numbers, with the existence of mask alignment errors and for a fixed grating period, is compared, and it is found that an eight-level structure does not always give the best value.
© 1998 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(050.1970) Diffraction and gratings : Diffractive optics
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.1950) Optical devices : Diffraction gratings
Citation
Yasuyuki Unno, "Fabrication of N-Level Binary Optical Elements by Use of M Mask Patterns with N in the Range of 2M-1 + 1 ≤ N ≤ 2M," Appl. Opt. 37, 8012-8020 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-34-8012
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