Model diffraction-limited optical systems are examined for the effects of radiation-induced compaction on optical performance. The Zernike phase aberration terms resulting from 193-nm-induced compaction in a model lithographic system are calculated with Fourier optics and ray tracing. Using experimental densification rates and the extracted aberration terms, we develop equations describing a useful system lifetime as a function of relevant system variables. In the example examined, the useful life depends strongly on the throughput, resist sensitivity, and partial coherence.
© 1998 Optical Society of America
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(100.2960) Image processing : Image analysis
(110.3960) Imaging systems : Microlithography
(220.1010) Optical design and fabrication : Aberrations (global)
Richard Schenker and William Oldham, "Damage-Limited Lifetime of 193-nm Lithography Tools as a Function of System Variables," Appl. Opt. 37, 733-738 (1998)