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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 4 — Feb. 1, 1998
  • pp: 733–738

Damage-limited lifetime of 193-nm lithography tools as a function of system variables

Richard Schenker and William Oldham  »View Author Affiliations


Applied Optics, Vol. 37, Issue 4, pp. 733-738 (1998)
http://dx.doi.org/10.1364/AO.37.000733


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Abstract

Model diffraction-limited optical systems are examined for the effects of radiation-induced compaction on optical performance. The Zernike phase aberration terms resulting from 193-nm-induced compaction in a model lithographic system are calculated with Fourier optics and ray tracing. Using experimental densification rates and the extracted aberration terms, we develop equations describing a useful system lifetime as a function of relevant system variables. In the example examined, the useful life depends strongly on the throughput, resist sensitivity, and partial coherence.

© 1998 Optical Society of America

OCIS Codes
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(100.2960) Image processing : Image analysis
(110.3960) Imaging systems : Microlithography
(220.1010) Optical design and fabrication : Aberrations (global)

History
Original Manuscript: May 12, 1997
Revised Manuscript: September 26, 1997
Published: February 1, 1998

Citation
Richard Schenker and William Oldham, "Damage-limited lifetime of 193-nm lithography tools as a function of system variables," Appl. Opt. 37, 733-738 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-4-733

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