The use of photographic emulsions as a photoresist medium for fabricating relief blazed zone plates is described. Lithographic methods with masks with 256 gray levels were used in the fabrication process. An example of a zone plate working in the reflection mode at 45° and having 82% diffraction efficiency is shown.
© 1998 Optical Society of America
Original Manuscript: March 20, 1997
Published: February 1, 1998
Enrique Navarrete-Garcia and Sergio Calixto, "Surface relief zone plates fabricated with photographic emulsions," Appl. Opt. 37, 739-746 (1998)