Techniques for Measuring Aberrations in Lenses Used in Photolithography with Printed Patterns
Applied Optics, Vol. 38, Issue 13, pp. 2800-2807 (1999)
http://dx.doi.org/10.1364/AO.38.002800
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Abstract
In optical lithography, it is a serious problem that aberrations in projection lenses reduce the imaging quality. Therefore techniques to measure the aberrations are required that will predict the adverse effects of aberrations on lithographic imagery and reduce them. We present a measurement method that uses a fine grating and its imaging condition to quantify coma, astigmatism, and spherical aberration. With this method, these aberrations can be described with simple expressions from the measured results. Application of this method revealed the coma of Zernike polynomials for our krypton fluoride (KrF) excimer-laser scanner.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(220.1010) Optical design and fabrication : Aberrations (global)
(220.4840) Optical design and fabrication : Testing
Citation
Hiroshi Nomura and Takashi Sato, "Techniques for Measuring Aberrations in Lenses Used in Photolithography with Printed Patterns," Appl. Opt. 38, 2800-2807 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-13-2800
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