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Applied Optics

Applied Optics


  • Vol. 38, Iss. 16 — Jun. 1, 1999
  • pp: 3516–3522

Ultraviolet interferometry with apochromatic reflection optics

Wolfgang Emer and Johannes Schwider  »View Author Affiliations

Applied Optics, Vol. 38, Issue 16, pp. 3516-3522 (1999)

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To improve the resolution and the sensitivity of optical metrology, we have constructed an interferometer for vacuum-ultraviolet wavelengths. To examine the influence of the wavelength, especially with regard to the period of the object’s structure, we chose an apochromatic design. With reflective optics, wavelengths from 157 to 900 nm can be employed for interferometric measurements. The benefits and also the technological problems that accompany the use of vacuum-ultraviolet wavelengths are discussed. The design of this interferometer and measuring results with different wavelengths are presented.

© 1999 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(140.2180) Lasers and laser optics : Excimer lasers

Original Manuscript: July 27, 1998
Revised Manuscript: January 20, 1999
Published: June 1, 1999

Wolfgang Emer and Johannes Schwider, "Ultraviolet interferometry with apochromatic reflection optics," Appl. Opt. 38, 3516-3522 (1999)

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