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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 16 — Jun. 1, 1999
  • pp: 3523–3533

Dual-domain point diffraction interferometer

Patrick P. Naulleau and Kenneth A. Goldberg  »View Author Affiliations


Applied Optics, Vol. 38, Issue 16, pp. 3523-3533 (1999)
http://dx.doi.org/10.1364/AO.38.003523


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Abstract

The phase-shifting point diffraction interferometer has recently been developed and implemented at Lawrence Berkeley National Laboratory to meet the significant metrology challenge of characterizing extreme ultraviolet projection lithography systems. Here we present a refined version of this interferometer that overcomes the original design’s susceptibility to noise attributed to scattered light. The theory of the new hybrid spatial- and temporal-domain (dual-domain) point diffraction interferometer is described in detail and experimental results are presented.

© 1999 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(050.5080) Diffraction and gratings : Phase shift
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(260.7200) Physical optics : Ultraviolet, extreme

History
Original Manuscript: September 8, 1998
Revised Manuscript: March 1, 1999
Published: June 1, 1999

Citation
Patrick P. Naulleau and Kenneth A. Goldberg, "Dual-domain point diffraction interferometer," Appl. Opt. 38, 3523-3533 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-16-3523

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