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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 16 — Jun. 1, 1999
  • pp: 3610–3613

Ion-assisted deposition of oxide materials at room temperature by use of different ion sources

Hansjörg Niederwald, Sven Laux, Michael Kennedy, Uwe Schallenberg, Angela Duparré, M. Mertin, Norbert Kaiser, and Detlef Ristau  »View Author Affiliations


Applied Optics, Vol. 38, Issue 16, pp. 3610-3613 (1999)
http://dx.doi.org/10.1364/AO.38.003610


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Abstract

Thin films of SiO2, TiO2, Ta2O5, ZrO2, and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance. The film properties are compared for the three different ion sources.

© 1999 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

History
Original Manuscript: October 15, 1998
Revised Manuscript: January 20, 1999
Published: June 1, 1999

Citation
Hansjörg Niederwald, Sven Laux, Michael Kennedy, Uwe Schallenberg, Angela Duparré, M. Mertin, Norbert Kaiser, and Detlef Ristau, "Ion-assisted deposition of oxide materials at room temperature by use of different ion sources," Appl. Opt. 38, 3610-3613 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-16-3610

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