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Applied Optics

Applied Optics


  • Vol. 38, Iss. 19 — Jul. 1, 1999
  • pp: 4177–4181

Determination of the refractive indices of layers in a multilayer stack by a guided-wave technique

Josep Massaneda, Francois Flory, and Emile Pelletier  »View Author Affiliations

Applied Optics, Vol. 38, Issue 19, pp. 4177-4181 (1999)

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The m-lines technique is used to measure the refractive indices and thicknesses of layers embedded in a multilayer stack. The multilayer considered is deposited by ion plating. Its formula is silica–4HL–4HL–6H–air, where H and L denote Ta2O5 and SiO2λ/4 layers, respectively, with λ = 514.5 nm. Measurements indicate that the refractive index of Ta2O5 is 5 × 10-3 greater when the layer is close to air than when the layer is inside the coating and that the Ta2O5 is slightly more birefringent.

© 1999 Optical Society of America

OCIS Codes
(230.7390) Optical devices : Waveguides, planar
(260.1440) Physical optics : Birefringence
(290.3030) Scattering : Index measurements
(310.0310) Thin films : Thin films
(310.2790) Thin films : Guided waves
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: December 15, 1998
Revised Manuscript: April 8, 1999
Published: July 1, 1999

Josep Massaneda, Francois Flory, and Emile Pelletier, "Determination of the refractive indices of layers in a multilayer stack by a guided-wave technique," Appl. Opt. 38, 4177-4181 (1999)

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