A compact holographic projector system was built and tested. This projection system offers a practical approach for making a highly corrected mesh or grid pattern on curved surfaces. The pattern can range in size from multimicrometer to submicrometer dimensions and be recorded in either positive or negative photoresist. Standing-wave interference patterns in the form of a diverging close-packed lattice of either hexagonal or square rodlike intensity maxima extending outward from a point or a locus of points are produced by multiple-beam holography that involves the combination of a holographic diffraction grating and a hypercomatic focusing objective.
© 1999 Optical Society of America
Original Manuscript: May 18, 1998
Revised Manuscript: September 9, 1998
Published: January 10, 1999
Kenneth M. Baker, "Highly corrected submicrometer grid patterning on curved surfaces," Appl. Opt. 38, 339-351 (1999)