Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography
Applied Optics, Vol. 38, Issue 22, pp. 4885-4890 (1999)
http://dx.doi.org/10.1364/AO.38.004885
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Abstract
We demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) film, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al–Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swing effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(310.1210) Thin films : Antireflection coatings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
Citation
Hsuen-Li Chen and Lon A. Wang, "Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography," Appl. Opt. 38, 4885-4890 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-22-4885
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