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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 22 — Aug. 1, 1999
  • pp: 4885–4890

Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography

Hsuen-Li Chen and Lon A. Wang  »View Author Affiliations


Applied Optics, Vol. 38, Issue 22, pp. 4885-4890 (1999)
http://dx.doi.org/10.1364/AO.38.004885


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Abstract

We demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) film, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al–Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swing effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer.

© 1999 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(310.1210) Thin films : Antireflection coatings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: January 12, 1999
Revised Manuscript: April 26, 1999
Published: August 1, 1999

Citation
Hsuen-Li Chen and Lon A. Wang, "Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography," Appl. Opt. 38, 4885-4890 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-22-4885

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