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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 23 — Aug. 10, 1999
  • pp: 4980–4984

Interferometric characterization of subwavelength lamellar gratings

Philippe Lalanne, P. Pichon, P. Chavel, E. Cambril, and H. Launois  »View Author Affiliations


Applied Optics, Vol. 38, Issue 23, pp. 4980-4984 (1999)
http://dx.doi.org/10.1364/AO.38.004980


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Abstract

We propose a new, to our knowledge, method for determining the two main critical parameters of periodic one-dimensional lamellar structures, namely, linewidths and etched depths. The method is simple and requires only two measurements for the phase of the zero-transmitted order under two orthogonal polarizations. It is inspired by the analogy between subwavelength gratings and anisotropic homogeneous thin films. The method is tested with experimental data obtained with a Mach–Zehnder interferometer. Etched depths and linewidths derived from the interferograms and electromagnetic theory are compared with scanning-electron-microscope observations.

© 1999 Optical Society of America

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1970) Diffraction and gratings : Diffractive optics
(290.3200) Scattering : Inverse scattering

History
Original Manuscript: January 27, 1999
Revised Manuscript: April 23, 1999
Published: August 10, 1999

Citation
Philippe Lalanne, P. Pichon, P. Chavel, E. Cambril, and H. Launois, "Interferometric characterization of subwavelength lamellar gratings," Appl. Opt. 38, 4980-4984 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-23-4980

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