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Applied Optics

Applied Optics


  • Vol. 38, Iss. 25 — Sep. 1, 1999
  • pp: 5447–5451

Variation of band-edge position with errors in the monitoring of layer termination level for long- and short-wave pass filters

Ronald R. Willey and David E. Machado  »View Author Affiliations

Applied Optics, Vol. 38, Issue 25, pp. 5447-5451 (1999)

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Optical monitoring of periodic thin-film stacks by the termination of each layer at the same constant photometric level has certain advantages. One of these principal advantages is the error compensation effect in the vicinity of the monitoring wavelength. In this study, we examine, by simulation, the effect of an error in the knowledge of the absolute value of the photometric termination level on the probable stability in the manufacture of the edge position of a blocked band. The results include equations that allow the determination of the appropriate values of parameters associated with the optimum termination levels to minimize the effects of such errors.

© 1999 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication

Original Manuscript: February 26, 1999
Revised Manuscript: May 17, 1999
Published: September 1, 1999

Ronald R. Willey and David E. Machado, "Variation of band-edge position with errors in the monitoring of layer termination level for long- and short-wave pass filters," Appl. Opt. 38, 5447-5451 (1999)

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  1. W. P. Thoeni, “Deposition of optical coatings: process control and automation,” Thin Solid Films 88, 385–397 (1982). [CrossRef]
  2. H. A. Macleod, E. Pelletier, “Error compensation mechanisms in some thin-film monitoring systems,” Opt. Acta 24, 907–930 (1977). [CrossRef]
  3. F. Zhao, “Monitoring of periodic multilayer by the level method,” Appl. Opt. 24, 3339–3342 (1985). [CrossRef]
  4. R. R. Willey, “Monitoring and control of thin film growth,” in Practical Design and Production of Optical Thin Films (Marcel Dekker, New York, 1996).
  5. R. R. Willey, “Optical thickness monitoring sensitivity improvement using graphical methods,” Appl. Opt. 26, 729–737 (1987). [CrossRef] [PubMed]
  6. J. H. Apfel, “Graphics in optical coating design,” Appl. Opt. 11, 1303–1312 (1972). [CrossRef] [PubMed]
  7. S. R. Schmidt, R. G. Launsby, “Box-Behnken designs,” in Understanding Industrial Designed Experiments (Air Academy Press, Colorado Springs, Colo., 1994), Sect. 3.8.
  8. doe kiss, version 97 for Windows, Air Academy Associates (and Digital Computations, Inc.), 1155 Kelly Johnson Blvd., Colorado Springs, Colo. 80920 (1997).
  9. FilmStar Design, FTG Software Associates, P.O. Box 579, Princeton, N.J. 08542 (1998).

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