Spatial Pattern of Microchannel Formation in Fused Silica Irradiated by Nanosecond Ultraviolet Pulses
Applied Optics, Vol. 38, Issue 27, pp. 5785-5788 (1999)
http://dx.doi.org/10.1364/AO.38.005785
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Abstract
We present numerical simulations of propagation of ultraviolet pulses through fused silica using a model that allows for the accumulative action of compaction back on the light. Compaction-induced self-focusing causes the light field to develop into a pattern of hot spots around the incident aperture that correlates with the damage patterns observed during marathon experiments designed to determine the onset of microchannel formation.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(190.4420) Nonlinear optics : Nonlinear optics, transverse effects in
(190.5940) Nonlinear optics : Self-action effects
Citation
Ewan M. Wright, Masud Mansuripur, Vladimir Liberman, and Keith Bates, "Spatial Pattern of Microchannel Formation in Fused Silica Irradiated by Nanosecond Ultraviolet Pulses," Appl. Opt. 38, 5785-5788 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-27-5785
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