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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 27 — Sep. 20, 1999
  • pp: 5785–5788

Spatial pattern of microchannel formation in fused silica irradiated by nanosecond ultraviolet pulses

Ewan M. Wright, Masud Mansuripur, Vladimir Liberman, and Keith Bates  »View Author Affiliations


Applied Optics, Vol. 38, Issue 27, pp. 5785-5788 (1999)
http://dx.doi.org/10.1364/AO.38.005785


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Abstract

We present numerical simulations of propagation of ultraviolet pulses through fused silica using a model that allows for the accumulative action of compaction back on the light. Compaction-induced self-focusing causes the light field to develop into a pattern of hot spots around the incident aperture that correlates with the damage patterns observed during marathon experiments designed to determine the onset of microchannel formation.

© 1999 Optical Society of America

OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(190.4420) Nonlinear optics : Nonlinear optics, transverse effects in
(190.5940) Nonlinear optics : Self-action effects

History
Original Manuscript: April 20, 1999
Revised Manuscript: June 18, 1999
Published: September 20, 1999

Citation
Ewan M. Wright, Masud Mansuripur, Vladimir Liberman, and Keith Bates, "Spatial pattern of microchannel formation in fused silica irradiated by nanosecond ultraviolet pulses," Appl. Opt. 38, 5785-5788 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-27-5785

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