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Applied Optics

Applied Optics


  • Vol. 38, Iss. 28 — Oct. 1, 1999
  • pp: 5968–5973

Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry

Seung-Woo Kim and Gee-Hong Kim  »View Author Affiliations

Applied Optics, Vol. 38, Issue 28, pp. 5968-5973 (1999)

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White-light scanning interferometry is increasingly used for precision profile metrology of engineering surfaces, but its current applications are limited primarily to opaque surfaces with relatively simple optical reflection behavior. A new attempt is made to extend the interferometric method to the thickness-profile measurement of transparent thin-film layers. An extensive frequency-domain analysis of multiple reflection is performed to allow both the top and the bottom interfaces of a thin-film layer to be measured independently at the same time by the nonlinear least-squares technique. This rigorous approach provides not only point-by-point thickness probing but also complete volumetric film profiles digitized in three dimensions.

© 1999 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(240.0310) Optics at surfaces : Thin films
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: January 4, 1999
Revised Manuscript: June 29, 1999
Published: October 1, 1999

Seung-Woo Kim and Gee-Hong Kim, "Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry," Appl. Opt. 38, 5968-5973 (1999)

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