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Applied Optics

Applied Optics


  • Vol. 38, Iss. 28 — Oct. 1, 1999
  • pp: 5981–5994

Absolute interferometry with a 670-nm external cavity diode laser

Jack A. Stone, Alois Stejskal, and Lowell Howard  »View Author Affiliations

Applied Optics, Vol. 38, Issue 28, pp. 5981-5994 (1999)

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In the past few years there has been much interest in use of tunable diode lasers for absolute interferometry. Here we report on use of an external cavity diode laser operating in the visible (λ ∼ 670 nm) for absolute distance measurements. Under laboratory conditions we achieve better than 1-µm standard uncertainty in distance measurements over a range of 5 m, but significantly larger uncertainties will probably be more typical of shop-floor measurements where conditions are far from ideal. We analyze the primary sources of uncertainty limiting the performance of wavelength-sweeping methods for absolute interferometry, and we discuss how errors can be minimized. Many errors are greatly magnified when the wavelength sweeping technique is used; sources of error that are normally relevant only at the nanometer level when standard interferometric techniques are used may be significant here for measurements at the micrometer level.

© 1999 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry

Original Manuscript: March 29, 1999
Revised Manuscript: June 28, 1999
Published: October 1, 1999

Jack A. Stone, Alois Stejskal, and Lowell Howard, "Absolute interferometry with a 670-nm external cavity diode laser," Appl. Opt. 38, 5981-5994 (1999)

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