We present a simple, cost-effective method for creating diffractive optical elements on the surfaces of optical fibers and fiber-optic components by use of 193-nm ablation techniques. It is an outgrowth of a more fundamental investigation of the effects of intense UV radiation fields on SiO<sub>2</sub>- and Ge–SiO<sub>2</sub>-based structures (specifically optical fibers and preforms) and allows the inexpensive fabrication of structures such as the suggested evanescent-field-based sensing device.
© 1999 Optical Society of America
(050.1970) Diffraction and gratings : Diffractive optics
(110.2760) Imaging systems : Gradient-index lenses
(110.5220) Imaging systems : Photolithography
(140.2180) Lasers and laser optics : Excimer lasers
(260.1960) Physical optics : Diffraction theory
Erica J. Thompson, Eric D. Brass, Kenneth Samuel, Sugar R. Bullock, James Lindesay, and Donald R. Lyons, "Formation of Phase Gratings on the End of Gradient-Index Lenses with Ultraviolet Ablation at 193 nm," Appl. Opt. 38, 6494-6497 (1999)