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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 31 — Nov. 1, 1999
  • pp: 6494–6497

Formation of phase gratings on the end of gradient-index lenses with ultraviolet ablation at 193 nm

Erica J. Thompson, Eric D. Brass, Kenneth Samuel, Sugar R. Bullock, James Lindesay, and Donald R. Lyons  »View Author Affiliations


Applied Optics, Vol. 38, Issue 31, pp. 6494-6497 (1999)
http://dx.doi.org/10.1364/AO.38.006494


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Abstract

We present a simple, cost-effective method for creating diffractive optical elements on the surfaces of optical fibers and fiber-optic components by use of 193-nm ablation techniques. It is an outgrowth of a more fundamental investigation of the effects of intense UV radiation fields on SiO2- and Ge–SiO2-based structures (specifically optical fibers and preforms) and allows the inexpensive fabrication of structures such as the suggested evanescent-field-based sensing device.

© 1999 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.2760) Imaging systems : Gradient-index lenses
(110.5220) Imaging systems : Photolithography
(140.2180) Lasers and laser optics : Excimer lasers
(260.1960) Physical optics : Diffraction theory

History
Original Manuscript: May 5, 1999
Revised Manuscript: August 27, 1999
Published: November 1, 1999

Citation
Erica J. Thompson, Eric D. Brass, Kenneth Samuel, Sugar R. Bullock, James Lindesay, and Donald R. Lyons, "Formation of phase gratings on the end of gradient-index lenses with ultraviolet ablation at 193 nm," Appl. Opt. 38, 6494-6497 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-31-6494


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References

  1. S. Houde-Walter, “Recent progress in gradient-index optics,” in Gradient-Index Optics and Miniature Optics, J. D. Rees, D. C. Leiner, eds., Proc. SPIE935, 2–26 (1988). [CrossRef]
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  4. Y. Kawamura, K. Toyoda, S. Namba, “Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser,” Appl. Phys. Lett. 40, 374–375 (1982). [CrossRef]
  5. A. Mukherjee, B. J. Eapen, S. K. Baral, “Very low loss channel waveguides in polymethylmethacrylate,” Appl. Phys. Lett. 65, 3179–3181 (1994). [CrossRef]
  6. J. E. Bjorkholm, L. Eichner, J. C. White, R. E. Howard, “Direct writing in self-developing resists using low-power cw ultraviolet light,” J. Appl. Phys. 58, 2098–2100 (1986). [CrossRef]
  7. D. R. Lyons, (LLNL, Livermore, Calif.1986–1990).

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