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Applied Optics

Applied Optics


  • Vol. 38, Iss. 31 — Nov. 1, 1999
  • pp: 6638–6641

Deposition at low substrate temperatures of high-quality TiO2 films by radical beam–assisted evaporation

Yasumi Yamada, Haruo Uyama, Shigeyuki Watanabe, and Hisakazu Nozoye  »View Author Affiliations

Applied Optics, Vol. 38, Issue 31, pp. 6638-6641 (1999)

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We deposited high-quality TiO2 films by an oxygen-radical beam–assisted evaporation (RBE) method at a lower substrate temperature (Ts) than that for a TiO2 film deposited by conventional thermal evaporation (TE) with neutral-oxygen gas. The films were then evaluated in terms of refractive index, shift of wavelength of a peak in the reflection curve, and absorption coefficient. The TiO2 films deposited by RBE at Ts < 473 K showed higher refractive indices, were more compact, and had lower absorption coefficients than the film deposited by TE at Ts = 473 K.

© 1999 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: March 10, 1999
Revised Manuscript: June 15, 1999
Published: November 1, 1999

Yasumi Yamada, Haruo Uyama, Shigeyuki Watanabe, and Hisakazu Nozoye, "Deposition at low substrate temperatures of high-quality TiO2 films by radical beam–assisted evaporation," Appl. Opt. 38, 6638-6641 (1999)

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