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Applied Optics

Applied Optics


  • Vol. 38, Iss. 4 — Feb. 1, 1999
  • pp: 695–703

Emission pattern of real vapor sources in high vacuum: an overview

Francisco Villa and Octavio Pompa  »View Author Affiliations

Applied Optics, Vol. 38, Issue 4, pp. 695-703 (1999)

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Emission characteristics of real vapor sources are analyzed on the basis of experimental results. It is found that some real sources have complex emission behaviors that agree only with a model that assumes a virtual surface instead of the real one.

© 1999 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

Original Manuscript: July 10, 1998
Revised Manuscript: November 6, 1998
Published: February 1, 1999

Francisco Villa and Octavio Pompa, "Emission pattern of real vapor sources in high vacuum: an overview," Appl. Opt. 38, 695-703 (1999)

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  1. L. Holland, Vacuum Deposition of Thin Films (Wiley, New York, 1956).
  2. H. K. Pulker, Coatings on Glass (Elsevier, Amsterdan, 1984).
  3. A. Musset, I. C. Stevenson, “Thickness distribution of evaporated films,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 287–291 (1990). [CrossRef]

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