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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 4 — Feb. 1, 1999
  • pp: 695–703

Emission Pattern of Real Vapor Sources in High Vacuum: An Overview

Francisco Villa and Octavio Pompa  »View Author Affiliations


Applied Optics, Vol. 38, Issue 4, pp. 695-703 (1999)
http://dx.doi.org/10.1364/AO.38.000695


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Abstract

Emission characteristics of real vapor sources are analyzed on the basis of experimental results. It is found that some real sources have complex emission behaviors that agree only with a model that assumes a virtual surface instead of the real one.

© 1999 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

Citation
Francisco Villa and Octavio Pompa, "Emission Pattern of Real Vapor Sources in High Vacuum: An Overview," Appl. Opt. 38, 695-703 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-4-695


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References

  1. L. Holland, Vacuum Deposition of Thin Films (Wiley, New York, 1956).
  2. H. K. Pulker, Coatings on Glass (Elsevier, Amsterdan, 1984).
  3. A. Musset and I. C. Stevenson, “Thickness distribution of evaporated films,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE 1270, 287–291 (1990).

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