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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 4 — Feb. 1, 1999
  • pp: 695–703

Emission pattern of real vapor sources in high vacuum: an overview

Francisco Villa and Octavio Pompa  »View Author Affiliations


Applied Optics, Vol. 38, Issue 4, pp. 695-703 (1999)
http://dx.doi.org/10.1364/AO.38.000695


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Abstract

Emission characteristics of real vapor sources are analyzed on the basis of experimental results. It is found that some real sources have complex emission behaviors that agree only with a model that assumes a virtual surface instead of the real one.

© 1999 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

History
Original Manuscript: July 10, 1998
Revised Manuscript: November 6, 1998
Published: February 1, 1999

Citation
Francisco Villa and Octavio Pompa, "Emission pattern of real vapor sources in high vacuum: an overview," Appl. Opt. 38, 695-703 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-4-695

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