A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 μm and position accuracy of 0.1 μm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm <i>f</i>/1.1 zone plate written directly is demonstrated at a λ/50 rms wave-front error corresponding to a 0.06-μm pattern accuracy. Several examples of fabricated diffractive elements are presented.
© 1999 Optical Society of America
(050.1380) Diffraction and gratings : Binary optics
(050.1970) Diffraction and gratings : Diffractive optics
(090.1760) Holography : Computer holography
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
Alexander G. Poleshchuk, Evgeny G. Churin, Voldemar P. Koronkevich, Victor P. Korolkov, Andrei A. Kharissov, Vadim V. Cherkashin, Valerii P. Kiryanov, Aleksei V. Kiryanov, Sergei A. Kokarev, and Alexander G. Verhoglyad, "Polar Coordinate Laser Pattern Generator for Fabrication of Diffractive Optical Elements With Arbitrary Structure," Appl. Opt. 38, 1295-1301 (1999)