The spectral performances of nonideal rectangular Bragg gratings, integrated in a rib waveguide, are analyzed by a multilayer approach based on the effective-index method. The effects of errors on the photolithographic definition of the grating, that is, period and shape, and of errors on the control of etching depth are investigated. Also the influence of the stitching error, which is unavoidable when the grating is realized by means of electron-beam photolithography, is addressed. A novel analytical approach that extends coupled-mode theory to the analysis of real gratings is also presented.
© 1999 Optical Society of America
Original Manuscript: March 25, 1998
Revised Manuscript: September 21, 1998
Published: March 20, 1999
Giuseppe Coppola, Andrea Irace, Antonello Cutolo, and Mario Iodice, "Effect of fabrication errors in channel waveguide Bragg gratings," Appl. Opt. 38, 1752-1758 (1999)