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Applied Optics

Applied Optics


  • Vol. 39, Iss. 10 — Apr. 1, 2000
  • pp: 1486–1492

Fabrication of thin-film micropolarizer arrays for visible imaging polarimetry

Junpeng Guo and David Brady  »View Author Affiliations

Applied Optics, Vol. 39, Issue 10, pp. 1486-1492 (2000)

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We describe a microfabrication process for fabricating micropolarizer devices with polarization thin film. The polarization film is less than a 0.5 µm thick and can have a polarization extinction ratio of ∼330 in the visible wavelength range. A single-state micropolarizer array with polarizing pixels as small as 5 µm × 5 µm has been fabricated. A multilayer spatially multiplexed three-state micropolarizer line array with a 14.4-µm resolution has also been fabricated for visible imaging polarimetry application.

© 2000 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(150.6910) Machine vision : Three-dimensional sensing
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication
(230.5440) Optical devices : Polarization-selective devices

Original Manuscript: December 17, 1999
Revised Manuscript: December 16, 1999
Published: April 1, 2000

Junpeng Guo and David Brady, "Fabrication of thin-film micropolarizer arrays for visible imaging polarimetry," Appl. Opt. 39, 1486-1492 (2000)

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