Correction Masks for Thickness Uniformity in Large-Area Thin Films
Applied Optics, Vol. 39, Issue 10, pp. 1602-1610 (2000)
http://dx.doi.org/10.1364/AO.39.001602
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Abstract
Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.
© 2000 Optical Society of America
OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.6870) Thin films : Thin films, other properties
Citation
Francisco Villa, Amalia Martínez, and Luis E. Regalado, "Correction Masks for Thickness Uniformity in Large-Area Thin Films," Appl. Opt. 39, 1602-1610 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-10-1602
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