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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 10 — Apr. 1, 2000
  • pp: 1602–1610

Correction masks for thickness uniformity in large-area thin films

Francisco Villa, Amalia Martínez, and Luis E. Regalado  »View Author Affiliations


Applied Optics, Vol. 39, Issue 10, pp. 1602-1610 (2000)
http://dx.doi.org/10.1364/AO.39.001602


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Abstract

Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.

© 2000 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.6870) Thin films : Thin films, other properties

History
Original Manuscript: July 27, 1999
Revised Manuscript: October 18, 1999
Published: April 1, 2000

Citation
Francisco Villa, Amalia Martínez, and Luis E. Regalado, "Correction masks for thickness uniformity in large-area thin films," Appl. Opt. 39, 1602-1610 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-10-1602


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References

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  12. A. Musset, I. Stevenson, “Thickness distribution of evaporated films,” in Optical Thin Films and Applications, H. Herrmann, ed., Proc. SPIE1270, 287–291 (1990). [CrossRef]

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