Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.
© 2000 Optical Society of America
Original Manuscript: July 27, 1999
Revised Manuscript: October 18, 1999
Published: April 1, 2000
Francisco Villa, Amalia Martínez, and Luis E. Regalado, "Correction masks for thickness uniformity in large-area thin films," Appl. Opt. 39, 1602-1610 (2000)