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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 10 — Apr. 1, 2000
  • pp: 1617–1625

Mo/Si and Mo/Be Multilayer Thin Films on Zerodur Substrates for Extreme-Ultraviolet Lithography

Paul B. Mirkarimi, Sasa Bajt, and Mark A. Wall  »View Author Affiliations


Applied Optics, Vol. 39, Issue 10, pp. 1617-1625 (2000)
http://dx.doi.org/10.1364/AO.39.001617


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Abstract

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06–0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decrease more steeply than Mo/Si for roughness values greater than approximately 0.2–0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar.

© 2000 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(230.4170) Optical devices : Multilayers
(240.0310) Optics at surfaces : Thin films
(260.7200) Physical optics : Ultraviolet, extreme
(290.5880) Scattering : Scattering, rough surfaces
(310.0310) Thin films : Thin films

Citation
Paul B. Mirkarimi, Sasa Bajt, and Mark A. Wall, "Mo/Si and Mo/Be Multilayer Thin Films on Zerodur Substrates for Extreme-Ultraviolet Lithography," Appl. Opt. 39, 1617-1625 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-10-1617

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