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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 16 — Jun. 1, 2000
  • pp: 2772–2781

Reflectance Measurements and Optical Constants in the Extreme Ultraviolet for Thin Films of Ion-Beam-Deposited SiC, Mo, Mg2Si, and InSb and of Evaporated Cr

Juan I. Larruquert and Ritva A. M. Keski-Kuha  »View Author Affiliations


Applied Optics, Vol. 39, Issue 16, pp. 2772-2781 (2000)
http://dx.doi.org/10.1364/AO.39.002772


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Abstract

Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to 200.0 nm. In this spectral region no optical constant data were available for materials deposited by ion-beam deposition. We compared our data with those for bulk samples and for thin films prepared by different techniques. The goal of this research has been to study candidate materials for multilayer coatings in the EUV.

© 2000 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0310) Optics at surfaces : Thin films
(260.7200) Physical optics : Ultraviolet, extreme
(260.7210) Physical optics : Ultraviolet, vacuum
(310.1620) Thin films : Interference coatings

Citation
Juan I. Larruquert and Ritva A. M. Keski-Kuha, "Reflectance Measurements and Optical Constants in the Extreme Ultraviolet for Thin Films of Ion-Beam-Deposited SiC, Mo, Mg2Si, and InSb and of Evaporated Cr," Appl. Opt. 39, 2772-2781 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-16-2772


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References

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