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Applied Optics

Applied Optics


  • Vol. 39, Iss. 16 — Jun. 1, 2000
  • pp: 2772–2781

Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr

Juan I. Larruquert and Ritva A. M. Keski-Kuha  »View Author Affiliations

Applied Optics, Vol. 39, Issue 16, pp. 2772-2781 (2000)

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Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to 200.0 nm. In this spectral region no optical constant data were available for materials deposited by ion-beam deposition. We compared our data with those for bulk samples and for thin films prepared by different techniques. The goal of this research has been to study candidate materials for multilayer coatings in the EUV.

© 2000 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0310) Optics at surfaces : Thin films
(260.7200) Physical optics : Ultraviolet, extreme
(260.7210) Physical optics : Ultraviolet, vacuum
(310.1620) Thin films : Interference coatings

Original Manuscript: November 12, 1999
Revised Manuscript: March 14, 2000
Published: June 1, 2000

Juan I. Larruquert and Ritva A. M. Keski-Kuha, "Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr," Appl. Opt. 39, 2772-2781 (2000)

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  1. J. I. Larruquert, R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the extreme-ultraviolet spectral range of 50 to 121.6 nm,” Appl. Opt. 38, 1231–1236 (1999). [CrossRef]
  2. J. F. Osantowski, “Reflectance and optical constants for Cer-Vit from 250 to 1050 Å,” J. Opt. Soc. Am. 64, 834–838 (1974). [CrossRef]
  3. W. J. Choyke, R. F. Farich, R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006–2007 (1976), and references therein.
  4. E. D. Palik, Handbook of Optical Constants of Solids (Academic, San Diego, Calif., 1998).
  5. M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981). [CrossRef]
  6. R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815–2816 (1988). [CrossRef] [PubMed]
  7. R. A. M. Keski-Kuha, C. M. Fleetwood, J. Robichaud, “Performance of high density cast silicon carbide in the extreme ultraviolet,” Appl. Opt. 36, 4409–4410 (1997). [CrossRef] [PubMed]
  8. J. B. Kortright, D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841–2846 (1988). [CrossRef] [PubMed]
  9. D. Schwarcz, R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Beam-Solid Interactions for Materials Synthesis and Characterization, D. C. Jacobson, D. E. Luzzi, T. F. Heinz, M. Iwaki, eds., Mater. Res. Soc. Symp. Proc.354, 535–540 (1995). [CrossRef]
  10. D. Schwarcz, R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Ion–Solid Interactions for Materials Modification and Processing, D. B. Poker, D. Ila, Y. T. Cheng, L. R. Harriott, T. W. Sigmon, eds., Mat. Res. Soc. Symp. Proc.396, 503–508 (1996). [CrossRef]
  11. L. J. LeBlanc, J. S. Farrell, D. W. Juenker, “Far-ultraviolet reflectance of several transition metals,” J. Opt. Soc. Am. 54, 956–957 (1964). [CrossRef]
  12. D. W. Juenker, L. J. LeBlanc, C. R. Martin, “Optical properties of some transition metals,” J. Opt. Soc. Am. 58, 164–171 (1968). [CrossRef]
  13. J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974). [CrossRef]
  14. E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977). [CrossRef]
  15. M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).
  16. K. A. Kress, G. J. Lapeyre, “Optical properties of molybdenum and ruthenium,” J. Opt. Soc. Am. 60, 1681–1684 (1970). [CrossRef]
  17. J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976). [CrossRef]
  18. R. Manzke, “Optical properties of molybdenum by electron energy loss spectroscopy,” Phys. Status Solidi B 97, 157–160 (1980). [CrossRef]
  19. D. L. Windt, W. C. Cash, M. Scott, P. Arendt, B. Newnam, R. F. Fisher, A. B. Swartzlander, “Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 Å to 1216 Å,” Appl. Opt. 27, 246–278 (1988). [CrossRef] [PubMed]
  20. T. W. Barbee, “Multilayer optics for the soft x-ray and extreme ultraviolet,” Mater. Res. Bull. 15(2), 37–44 (1990).
  21. P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991). [CrossRef]
  22. P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992). [CrossRef]
  23. E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994), p. 184.
  24. M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.
  25. H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963). [CrossRef]
  26. P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).
  27. Yu P. Udoev, “Optical spectra of metals of the chromium subgroup,” Opt. Spectrosc. (USSR) 33, 185–186 (1972).
  28. C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974). [CrossRef]
  29. C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974). [CrossRef]
  30. J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

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