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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 17 — Jun. 10, 2000
  • pp: 2941–2947

At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems

Patrick Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, and Jeffrey Bokor  »View Author Affiliations


Applied Optics, Vol. 39, Issue 17, pp. 2941-2947 (2000)
http://dx.doi.org/10.1364/AO.39.002941


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Abstract

The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10×-reduction lithographic optical systems is presented.

© 2000 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(110.1650) Imaging systems : Coherence imaging
(110.2970) Imaging systems : Image detection systems
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(260.7200) Physical optics : Ultraviolet, extreme

History
Original Manuscript: November 8, 1999
Published: June 10, 2000

Citation
Patrick Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, and Jeffrey Bokor, "At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems," Appl. Opt. 39, 2941-2947 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-17-2941

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