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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 18 — Jun. 20, 2000
  • pp: 3165–3169

Nonlinear absorption of thin Al2O3 films at 193 nm

Oliver Apel, Klaus Mann, Alfons Zoeller, Rainer Goetzelmann, and Eric Eva  »View Author Affiliations


Applied Optics, Vol. 39, Issue 18, pp. 3165-3169 (2000)
http://dx.doi.org/10.1364/AO.39.003165


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Abstract

Absorption of thin Al2O3 films was measured at 193 nm with an ArF-laser calorimeter. In addition to the expected high linear absorption coefficient, we found, for the first time to our knowledge, that two-photon absorption and transient color-center formation are nonnegligible loss channels in thin films at 193 nm. The nonlinear absorption coefficient is of the order of several times 10-4 cm/W.

© 2000 Optical Society of America

OCIS Codes
(260.7190) Physical optics : Ultraviolet
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: July 23, 1999
Revised Manuscript: March 15, 2000
Published: June 20, 2000

Citation
Oliver Apel, Klaus Mann, Alfons Zoeller, Rainer Goetzelmann, and Eric Eva, "Nonlinear absorption of thin Al2O3 films at 193 nm," Appl. Opt. 39, 3165-3169 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-18-3165


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References

  1. N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995). [CrossRef]
  2. M. Zukic, D. G. Torr, J. F. Spann, R. M. Torr, “Vacuum ultraviolet thin films. 1. Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films,” Appl. Opt. 29, 4284–4292 (1990). [CrossRef] [PubMed]
  3. A. Zöller, “Temperature stability of optical coatings produced by plasma and ion assisted evaporation processes,” in Optical Interference Coatings, Vol. 9 of 1998 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1998), pp. 2–4.
  4. E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color center formation in UV-window materials,” Appl. Phys. A 62, 143–149 (1996).
  5. E. Eva, K. Mann, “Nonlinear absorption phenomena in optical materials for the UV-spectral range,” Appl. Surf. Sci. 109, 52–57 (1997). [CrossRef]
  6. V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, C. Van Peski, “Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications,” Opt. Lett. 24, 58–60 (1999). [CrossRef]
  7. H. Nishioka, T. Kawasumi, K. Ueda, H. Takuma, “Multiphoton absorption and avalanche processes in ultraviolet optical coatings,” Rev. Laser Eng. 20, 344–354 (1992). [CrossRef]
  8. K. R. Mann, O. Apel, E. Eva, “Characterization of absorption and scatter losses on optical components for ArF excimer lasers, in Laser-Induced Damage in Optical Materials: 1998,” H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE3578, 614–623 (1998).
  9. E. Eva, K. Mann, “Characterizing the absorption and aging behavior of DUV optical material by high-resolution excimer laser calorimetry,” in Optical Microlithography XI, L. Van den Hove, ed., Proc. SPIE3334, 1055–1061 (1998). [CrossRef]
  10. ISO11551, “Test method for absorptance of optical laser components,” (International Organization for Standardization, Geneva, 1997).
  11. S. Schippel, Layertec GmbH, Blankenhainer Strasse 169, D-99441 Mellingen, Germany (personal communication).

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