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Applied Optics

Applied Optics


  • Vol. 39, Iss. 19 — Jul. 1, 2000
  • pp: 3187–3191

Electron-beam-fabricated asymmetric transmission gratings for microspectroscopy

Pasi Laakkonen, Markku Kuittinen, Janne Simonen, and Jari Turunen  »View Author Affiliations

Applied Optics, Vol. 39, Issue 19, pp. 3187-3191 (2000)

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Asymmetric transmission gratings operating in the resonance domain are designed by modeling of the dose-controlled electron-beam lithography process with Gaussian convolution. We aim to exceed some efficiency limit η s over a specified spectral range and to maximize η s . The resultant continuous-profile gratings are fabricated by electron-beam lithography and proportional reactive-ion etching into SiO2. We demonstrate gratings with good signal-to-noise ratio and a diffraction efficiency greater than 40% for wavelengths from 400 to 750 nm.

© 2000 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.1970) Holography : Diffractive optics
(220.3740) Optical design and fabrication : Lithography

Original Manuscript: October 11, 1999
Revised Manuscript: March 14, 2000
Published: July 1, 2000

Pasi Laakkonen, Markku Kuittinen, Janne Simonen, and Jari Turunen, "Electron-beam-fabricated asymmetric transmission gratings for microspectroscopy," Appl. Opt. 39, 3187-3191 (2000)

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