Asymmetric transmission gratings operating in the resonance domain are designed by modeling of the dose-controlled electron-beam lithography process with Gaussian convolution. We aim to exceed some efficiency limit ηs over a specified spectral range and to maximize ηs. The resultant continuous-profile gratings are fabricated by electron-beam lithography and proportional reactive-ion etching into SiO2. We demonstrate gratings with good signal-to-noise ratio and a diffraction efficiency greater than 40% for wavelengths from 400 to 750 nm.
© 2000 Optical Society of America
Original Manuscript: October 11, 1999
Revised Manuscript: March 14, 2000
Published: July 1, 2000
Pasi Laakkonen, Markku Kuittinen, Janne Simonen, and Jari Turunen, "Electron-beam-fabricated asymmetric transmission gratings for microspectroscopy," Appl. Opt. 39, 3187-3191 (2000)