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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 19 — Jul. 1, 2000
  • pp: 3253–3260

Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography

Yanqiu Li, Hiroo Kinoshita, Takeo Watanabe, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki  »View Author Affiliations


Applied Optics, Vol. 39, Issue 19, pp. 3253-3260 (2000)
http://dx.doi.org/10.1364/AO.39.003253


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Abstract

A scanning critical illumination system is designed to couple a synchrotron radiation source to a three-aspherical-mirror imaging system for extreme ultraviolet lithography. A static illumination area of H × V = 8 mm × 3 mm (where H is horizontal and V is vertical) can be obtained. Uniform intensity distribution and a large ring field of H × V = 150 mm × 3 mm can be achieved by scanning of the mirror of the condenser. The coherence factor (σ) of this illumination system is ∼0.6, with the same beam divergence in both the horizontal and the vertical directions. We describe the performance of the imaging optics at σ = 0.6 to confirm that the illumination optics can meet the requirements for three-aspherical-mirror imaging optics with a feature size of 0.06 µm.

© 2000 Optical Society of America

OCIS Codes
(150.2950) Machine vision : Illumination
(220.3740) Optical design and fabrication : Lithography
(220.4830) Optical design and fabrication : Systems design

History
Original Manuscript: October 28, 1999
Revised Manuscript: February 29, 2000
Published: July 1, 2000

Citation
Yanqiu Li, Hiroo Kinoshita, Takeo Watanabe, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki, "Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography," Appl. Opt. 39, 3253-3260 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-19-3253


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References

  1. H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, H. Takenaka, Y. Torii, “Large-area, height-resolution pattern replication by the use of a two-aspherical-mirror system,” Appl. Opt. 34, 7079–7083 (1993). [CrossRef]
  2. D. W. Sweeney, R. M. Hudyma, H. N. Chapman, “EUV optical design for a 100-nm CD imaging system,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 2–10 (1998). [CrossRef]
  3. J. E. M. Goldsmith, P. K. Barr, K. W. Berger, L. J. Bernardez, G. F. Cardinsle, J. R. Darnold, D. R. Folk, S. J. Haney, C. C. Henderson, K. L. Jefferson, K. D. Krenz, G. D. Kubiak, R. P. Nissen, D. J. O’Connell, Y. E. Perras, A. K. Ray-Chaudhuri, T. G. Smith, R. H. Stulen, D. A. Tichenor, A. A. Ver Berkmoes, J. B. Wronosky, “Recent advances in the Sendia EUV 10× microstepper,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 11–19 (1998). [CrossRef]
  4. H. Kinoshita, T. Watanabe, M. Niibe, H. Oizumi, H. Yamanashi, K. Murakami, T. Oshino, Y. Y. Platonv, N. Grupido, “Three-aspherical-mirror system for EUV lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 20–31 (1998). [CrossRef]
  5. T. Haga, H. Kinoshita, “Illumination system for extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 13, 2914–2918 (1995). [CrossRef]
  6. D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, “Progress in the development of EUV image systems,” in Extreme Ultraviolet Lithography, G. D. Kubiak, D. R. Kania, eds., Vol. 4 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 2–8.
  7. W. C. Sweatt, G. N. Lawrence, “Physical optics modeling in soft-x-ray projection lithography,” Appl. Opt. 32, 6945–6951 (1993). [CrossRef] [PubMed]
  8. N. M. Ceglio, A. M. Hawryluk, G. E. Sommargren, “Front-end design issues in soft-x-ray projection lithography,” Appl. Opt. 32, 7050–7056 (1993). [CrossRef] [PubMed]
  9. G. E. Sommargren, L. G. Seppala, “Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography,” Appl. Opt. 32, 6938–6944 (1993). [CrossRef] [PubMed]
  10. S. J. Cohen, L. G. Seppala, “Critical illumination condenser for EUV projection lithography,” in Extreme Ultraviolet Lithography, D. Attwood, F. Zernike, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1994), pp. 109–115.
  11. J. B. Murphy, D. L. White, A. A. MacDwell, O. R. Wood, “Synchrotron radiation source and condenser for projection x-ray lithography,” Appl. Opt. 32, 6920–6929 (1993). [CrossRef] [PubMed]
  12. S. Goto, T. Taguchi, T. Osada, S. Okamura, T. Hisatsugu, “Synchrontron radiation beamline for x-ray lithography,” J. Vac. Sci. Technol. B. 11, 286–295 (1993). [CrossRef]
  13. E. Di Fabrizio, A. Nucara, M. Gentili, R. Cingolani, “Design of a beamline for soft and deep lithography on third generation synchrotron radiation source,” Rev. Sci. Instrum. 70, 1605–1613 (1999). [CrossRef]
  14. H. E. White, Fundamentals of Optics, 4th ed. (McGraw-Hill, New York, 1981), p. 530.
  15. O. R. Wood, W. T. Silfvast, T. E. Jewell, “Short-wavelength annular-field optical system for imaging tenth-micron features,” J. Vac. Sci. Technol. B 7, 1613–1615 (1989). [CrossRef]

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