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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 19 — Jul. 1, 2000
  • pp: 3253–3260

Illumination System Design for a Three-Aspherical-Mirror Projection Camera for Extreme-Ultraviolet Lithography

Yanqiu Li, Hiroo Kinoshita, Takeo Watanabe, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki  »View Author Affiliations


Applied Optics, Vol. 39, Issue 19, pp. 3253-3260 (2000)
http://dx.doi.org/10.1364/AO.39.003253


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Abstract

A scanning critical illumination system is designed to couple a synchrotron radiation source to a three-aspherical-mirror imaging system for extreme ultraviolet lithography. A static illumination area of H × V = 8 mm × 3 mm (where H is horizontal and V is vertical) can be obtained. Uniform intensity distribution and a large ring field of H × V = 150 mm × 3 mm can be achieved by scanning of the mirror of the condenser. The coherence factor (ς) of this illumination system is ~0.6, with the same beam divergence in both the horizontal and the vertical directions. We describe the performance of the imaging optics at ς = 0.6 to confirm that the illumination optics can meet the requirements for three-aspherical-mirror imaging optics with a feature size of 0.06 μm.

© 2000 Optical Society of America

OCIS Codes
(150.2950) Machine vision : Illumination
(220.3740) Optical design and fabrication : Lithography
(220.4830) Optical design and fabrication : Systems design

Citation
Yanqiu Li, Hiroo Kinoshita, Takeo Watanabe, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki, "Illumination System Design for a Three-Aspherical-Mirror Projection Camera for Extreme-Ultraviolet Lithography," Appl. Opt. 39, 3253-3260 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-19-3253

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