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Applied Optics

Applied Optics


  • Vol. 39, Iss. 22 — Aug. 1, 2000
  • pp: 3847–3853

Sinusoidal wavelength-scanning interferometric reflectometry

Osami Sasaki, Tomokazu Kuwahara, Ryohta Hara, and Takamasa Suzuki  »View Author Affiliations

Applied Optics, Vol. 39, Issue 22, pp. 3847-3853 (2000)

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We propose interferometric reflectometry in which a sinusoidal wavelength-scanning tunable laser diode is used to detect positions and profiles of multiple reflecting surfaces. An objective signal extracted from an interference signal contains modulation amplitude Z and phase α, which are related to the positions and profiles, respectively, of multiple reflecting surfaces. By using values of the objective signal at special times, we can produce an image intensity that shows where the reflecting surfaces exist. To obtain exact values of Z or values of α, we estimated the objective signal by using a conjugate gradient method. Experimental results show that a resolution of two-optical-path difference (OPD) in the image intensity is ∼60 µm, and the final OPD precisions are 2 and 8 µm for two and three reflecting surfaces, respectively, for a wavelength-scanning width of 7 nm. Profiles of the front and rear surfaces of a silica glass plate with a thickness of 20 µm have been measured with a precision of ∼10 nm.

© 2000 Optical Society of America

OCIS Codes
(110.4500) Imaging systems : Optical coherence tomography
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure

Original Manuscript: November 8, 1999
Revised Manuscript: April 20, 2000
Published: August 1, 2000

Osami Sasaki, Tomokazu Kuwahara, Ryohta Hara, and Takamasa Suzuki, "Sinusoidal wavelength-scanning interferometric reflectometry," Appl. Opt. 39, 3847-3853 (2000)

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