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Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

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Abstract

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

© 2000 Optical Society of America

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