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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 24 — Aug. 20, 2000
  • pp: 4296–4299

Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, and Lech Wosinski  »View Author Affiliations


Applied Optics, Vol. 39, Issue 24, pp. 4296-4299 (2000)
http://dx.doi.org/10.1364/AO.39.004296


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Abstract

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

© 2000 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(130.1750) Integrated optics : Components
(130.3130) Integrated optics : Integrated optics materials
(230.1950) Optical devices : Diffraction gratings
(230.3120) Optical devices : Integrated optics devices

History
Original Manuscript: January 28, 2000
Revised Manuscript: May 19, 2000
Published: August 20, 2000

Citation
John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, and Lech Wosinski, "Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation," Appl. Opt. 39, 4296-4299 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-24-4296

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