Birefringence Control in Plasma-Enhanced Chemical Vapor Deposition Planar Waveguides by Ultraviolet Irradiation
Applied Optics, Vol. 39, Issue 24, pp. 4296-4299 (2000)
http://dx.doi.org/10.1364/AO.39.004296
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Abstract
Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.
© 2000 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(130.1750) Integrated optics : Components
(130.3130) Integrated optics : Integrated optics materials
(230.1950) Optical devices : Diffraction gratings
(230.3120) Optical devices : Integrated optics devices
Citation
John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, and Lech Wosinski, "Birefringence Control in Plasma-Enhanced Chemical Vapor Deposition Planar Waveguides by Ultraviolet Irradiation," Appl. Opt. 39, 4296-4299 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-24-4296
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