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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 24 — Aug. 20, 2000
  • pp: 4296–4299

Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, and Lech Wosinski  »View Author Affiliations


Applied Optics, Vol. 39, Issue 24, pp. 4296-4299 (2000)
http://dx.doi.org/10.1364/AO.39.004296


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Abstract

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

© 2000 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(130.1750) Integrated optics : Components
(130.3130) Integrated optics : Integrated optics materials
(230.1950) Optical devices : Diffraction gratings
(230.3120) Optical devices : Integrated optics devices

History
Original Manuscript: January 28, 2000
Revised Manuscript: May 19, 2000
Published: August 20, 2000

Citation
John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, and Lech Wosinski, "Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation," Appl. Opt. 39, 4296-4299 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-24-4296


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References

  1. J. Albert, F. Bilodeau, D. C. Johnson, K. O. Hill, S. J. Mihailov, D. Stryckman, T. Kitigawa, Y. Hibino, “Polarization-independent strong Bragg gratings in planar lightwave circuits,” Electron. Lett. 34, 485–486 (1998). [CrossRef]
  2. J. Albert, F. Bilodeau, K. O. Hill, D. C. Johnson, Y. Hibino, M. Abe, “Birefringence control for ultraviolet-induced index change in planar lightwave circuits,” in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1999), pp. 24–26.
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  4. J. Canning, M. Åslund, “Birefringence compensation, improved fringe contrast, and trimming in an integrated asymmetric Mach–Zehnder interferometer using mid-IR laser processing,” Opt. Mater. 14, 175–183 (2000). [CrossRef]
  5. L. Wosinski, J. K. Sahu, H. Fernando, T. Augustsson, “Improvement of PECVD technology for low loss silica-on-silicon integrated optics,” presented at the European Conference on Integrated Optics (ECIO ’99), Turin, Italy, 13–16 April 1999.
  6. H. I. Inglis, “Photo-induced effects in optical fibres,” Ph.D. dissertation (Department of Physical Chemistry, University of Sydney, Sydney, NSW, Australia, 1997).
  7. J. Canning, “Engineering large anisotropy in amorphous glass,” Opt. Lett. 25, 233–235 (1999). [CrossRef]
  8. J. Nishii, H. Hosono, “Enormous photon-induced volume expansion of Ge-doped silica thin films,” in Photosensitivity and Poling in Glass Waveguides, E. J. Friebele, R. Kashyap, T. Erdogan, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1999), pp. 16–18.

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