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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 25 — Sep. 1, 2000
  • pp: 4535–4539

Angstrom ruler for high-accuracy pitch measurement

Wang Lin, Li Dacheng, Cao Mang, Ludger Koenders, Ulrich Kuetgens, and Peter Becker  »View Author Affiliations


Applied Optics, Vol. 39, Issue 25, pp. 4535-4539 (2000)
http://dx.doi.org/10.1364/AO.39.004535


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Abstract

An x-ray interferometer (XRI), which takes the lattice spacing of silicon as a length unit, can measure displacement with subnanometer resolution. A scanning probe microscope that combines an XRI and a scanning-tunnel microscope is designed to measure pitch. Experimental results have proved the feasibility of the design.

© 2000 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(340.7450) X-ray optics : X-ray interferometry

History
Original Manuscript: January 3, 2000
Revised Manuscript: April 17, 2000
Published: September 1, 2000

Citation
Wang Lin, Li Dacheng, Cao Mang, Ludger Koenders, Ulrich Kuetgens, and Peter Becker, "Angstrom ruler for high-accuracy pitch measurement," Appl. Opt. 39, 4535-4539 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-25-4535

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