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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 25 — Sep. 1, 2000
  • pp: 4535–4539

Angstrom ruler for high-accuracy pitch measurement

Wang Lin, Li Dacheng, Cao Mang, Ludger Koenders, Ulrich Kuetgens, and Peter Becker  »View Author Affiliations


Applied Optics, Vol. 39, Issue 25, pp. 4535-4539 (2000)
http://dx.doi.org/10.1364/AO.39.004535


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Abstract

An x-ray interferometer (XRI), which takes the lattice spacing of silicon as a length unit, can measure displacement with subnanometer resolution. A scanning probe microscope that combines an XRI and a scanning-tunnel microscope is designed to measure pitch. Experimental results have proved the feasibility of the design.

© 2000 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(340.7450) X-ray optics : X-ray interferometry

History
Original Manuscript: January 3, 2000
Revised Manuscript: April 17, 2000
Published: September 1, 2000

Citation
Wang Lin, Li Dacheng, Cao Mang, Ludger Koenders, Ulrich Kuetgens, and Peter Becker, "Angstrom ruler for high-accuracy pitch measurement," Appl. Opt. 39, 4535-4539 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-25-4535


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References

  1. D. G. Chetwynd, N. O. Krylova, S. T. Smith, “Metrological x-ray interferometry in the micrometer region,” Nanotechnology 7, 1–12 (1996). [CrossRef]
  2. P. Becker, G. Mana, “The lattice parameter of silicon: a survey,” Metrologia 31, 203–209 (1994). [CrossRef]
  3. P. Seyfrid, P. Becker, P. Kozdon, “A determination of the Avogadro constant,” Z. Phys. B 87, 289–298 (1992). [CrossRef]
  4. G. Basile, “A measurement of the silicon (220)-lattice spacing,” Phys. Rev. Lett. 72, 3133–3136 (1994). [CrossRef] [PubMed]
  5. Y. R. Zhou, Semiconductor Materials (Beijing Institute of Technology Press, Beijing, 1992), pp. 347–356.
  6. C. L. Bai, STM and Its Applications (Shanghai Science and Technology, Shanghai, 1991), pp. 11–12.
  7. S. J. Huang, Digital Signal Processing and Its Application (Defence Industry Press, Beijing, 1982), pp. 12–25.

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