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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 25 — Sep. 1, 2000
  • pp: 4690–4697

In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens

Bincheng Li, Sven Martin, and Eberhard Welsch  »View Author Affiliations


Applied Optics, Vol. 39, Issue 25, pp. 4690-4697 (2000)
http://dx.doi.org/10.1364/AO.39.004690


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Abstract

A simple and sensitive mode-mismatched thermal lens (TL) technique with a pulsed top-hat beam excitation and a near-field detection scheme is developed to measure in situ the thermoelastic and the thermooptical responses of ultraviolet (UV) dielectric coatings as well as bulk materials under excimer laser (193- or 248-nm) irradiations. Owing to its high sensitivity, the TL technique can be used for measurements at fluences far below the laser-induced damage threshold (LIDT). We report on the measurement of both linear and nonlinear absorption of the UV dielectric coatings and bulk materials as well as the investigation of time-resolved predamage phenomena, such as laser conditioning of highly reflective dielectric coatings and irradiation-induced changes of a coating’s various properties. The pulsed TL technique is also a convenient technique for accurate measurement of the LIDT of dielectric coatings and for distinguishing different damage mechanisms: thermal-stress-induced damage or melting-induced damage.

© 2000 Optical Society of America

OCIS Codes
(120.6810) Instrumentation, measurement, and metrology : Thermal effects
(140.3440) Lasers and laser optics : Laser-induced breakdown
(310.6870) Thin films : Thin films, other properties

History
Original Manuscript: March 10, 2000
Published: September 1, 2000

Citation
Bincheng Li, Sven Martin, and Eberhard Welsch, "In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens," Appl. Opt. 39, 4690-4697 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-25-4690

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