Nanoindentation hardness of particles used in magnetorheological finishing (MRF)

Aric B. Shorey; Kevin M. Kwong; Kerry M. Johnson; Stephen D. Jacobs

doi:10.1364/AO.39.005194

Applied Optics
Vol. 39,
Issue 28,
pp. 5194-5204
(2000)
•https://doi.org/10.1364/AO.39.005194

Nanoindentation hardness of particles used in magnetorheological finishing (MRF)

Aric B. Shorey, Kevin M. Kwong, Kerry M. Johnson, and Stephen D. Jacobs

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Aric B. Shorey, Kevin M. Kwong, Kerry M. Johnson, and Stephen D. Jacobs, "Nanoindentation hardness of particles used in magnetorheological finishing (MRF)," Appl. Opt. 39, 5194-5204 (2000)

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Abstract

Knowledge of the hardness of abrasive particles that are used in polishing is a key to the fundamental understanding of the mechanisms of material removal. The magnetorheological-finishing process uses both magnetic and nonmagnetic abrasive particles during polishing. The nanohardnesses of the micrometer-sized magnetic carbonyl iron and nonmagnetic abrasive particles have been measured successfully by use of novel, to our knowledge, sample-preparation and nanoindentation techniques. Some of the results reported compare favorably with existing microhardness data found in the literature, whereas other results are new.

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Abrasive	Moh’s Hardness		Knoop Hardness (GPa)		Vickers Hardness (GPa)
Abrasive	Value	Source	Value	Source	Value	Source
Aluminaa (bulk material)
	9	Ref. 42	16.58–24.22	Refs. 42 and 43
	9.4	Ref. 44
Sintered alumina (large particles)					15–25	Ref. 28
Cubic zirconiaa	8.0–8.5	Ref. 45
Cerium oxidea	6	Ref. 4
Silicon carbide (bulk material)	9.6	Ref. 44	22.15–31.63	Refs. 42 and 43

Particle	Material	Lot Number	Maker	Residual Amountsb (wt. %)				Nanoindentation (GPa)
Particle	Material	Lot Number	Maker	Nitrogen	Carbon	Oxygen	Maker	Hardness	Standard Deviation
OS 1225	CI	1225	Ref. 50	0.540	0.880	0.580	Ref. 53	14.4	0.8
OS 2983	CI	2983	Ref. 50	0.750	0.800	0.590	Ref. 53	13.1	0.6
OM	CI	3999	Ref. 50	0.800	0.790	0.240		12.4	1.0
EW	CI	9970	Ref. 50	1.000	0.800	0.500		11.7	0.8
OS 3770	CI	3770	Ref. 50	0.180	1.120	0.650	Ref. 53	10.5	1.0
S-1701	CI	6070111	Ref. 51	0.850	0.850	0.730		9.7	0.5
OS 5942	CI	5942	Ref. 50	0.060	1.170	0.320		7.3	1.0
OS 9560	CI	9560	Ref. 50	1.180	0.970	0.200		4.9	1.0
CM	CIc	7829	Ref. 50	<0.010	0.009	0.170	Ref. 53	2.4	0.5
R-1521	CIc	8052131	Ref. 51	0.024	0.033	0.240		2.2	1.0
Nickel	Carbonyl nickel	101397	Ref. 52					1.7	0.6

Abrasive	Thermal Treatment	Material	Lot Number	Maker	Crystal Structure	Nanoindentation (GPa)
Abrasive	Thermal Treatment	Material	Lot Number	Maker	Crystal Structure	Hardness	Standard Deviation
SiC	High	Silicon carbide	Not availableb	Ref. 54	Hexagonal	31.8	8.0
No. 30 Al₂O₃		Grinding alumina	C9043	Ref. 18	Hexagonal	29.8	7.0
CZ		Cubic zirconia	1502792	Ref. 55	Cubic	24.1	5.0
1-µm Al₂O₃		Polishing alumina	C602	Ref. 56	Not reported	10.0	4.0
SRS 372	High	Cerium oxide	SDH-13-1	Ref. 57	Not reported	7.5	2.0
SRS 373	Low	Cerium oxide	SDH-13-2	Ref. 57	Not reported	5.0	1.3

Glass	Lot Number	Maker	Nanoindentation (GPa)
Glass	Lot Number	Maker	Hardness	Standard Deviation
Fused silica	7940	Ref. 47	9.8	0.1
BK7	Not available	Ref. 13	7.7	0.1
LHG8	Not available	Ref. 48	5.3	0.1
KDP	Not available	Ref. 49	1.5	0.4

Abrasive	Moh’s Hardness		Knoop Hardness (GPa)		Vickers Hardness (GPa)
Abrasive	Value	Source	Value	Source	Value	Source
Aluminaa (bulk material)
	9	Ref. 42	16.58–24.22	Refs. 42 and 43
	9.4	Ref. 44
Sintered alumina (large particles)					15–25	Ref. 28
Cubic zirconiaa	8.0–8.5	Ref. 45
Cerium oxidea	6	Ref. 4
Silicon carbide (bulk material)	9.6	Ref. 44	22.15–31.63	Refs. 42 and 43

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Applied Optics