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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5768–5772

Phase-shifting point-diffraction interferometry at 193 nm

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar  »View Author Affiliations


Applied Optics, Vol. 39, Issue 31, pp. 5768-5772 (2000)
http://dx.doi.org/10.1364/AO.39.005768


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Abstract

Phase-shifting point-diffraction interferometry at the 193-nm wavelength suitable for highly accurate measurement of wave-front aberration is introduced. The interferometer preserves the advantages of the previously described extreme-ultraviolet phase-shifting point-diffraction interferometer but offers higher relative efficiency. Wave-front measurement of an imaging system, operating at the 193-nm wavelength, is reported. Direct measurement of the refractive-index change in a deep-ultraviolet radiation-damaged fused-silica sample is also presented as an application.

© 2000 Optical Society of America

OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(350.2770) Other areas of optics : Gratings

History
Original Manuscript: April 21, 2000
Revised Manuscript: July 6, 2000
Published: November 1, 2000

Citation
Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar, "Phase-shifting point-diffraction interferometry at 193 nm," Appl. Opt. 39, 5768-5772 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-31-5768

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