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Applied Optics

Applied Optics


  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5768–5772

Phase-shifting point-diffraction interferometry at 193 nm

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar  »View Author Affiliations

Applied Optics, Vol. 39, Issue 31, pp. 5768-5772 (2000)

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Phase-shifting point-diffraction interferometry at the 193-nm wavelength suitable for highly accurate measurement of wave-front aberration is introduced. The interferometer preserves the advantages of the previously described extreme-ultraviolet phase-shifting point-diffraction interferometer but offers higher relative efficiency. Wave-front measurement of an imaging system, operating at the 193-nm wavelength, is reported. Direct measurement of the refractive-index change in a deep-ultraviolet radiation-damaged fused-silica sample is also presented as an application.

© 2000 Optical Society of America

OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(350.2770) Other areas of optics : Gratings

Original Manuscript: April 21, 2000
Revised Manuscript: July 6, 2000
Published: November 1, 2000

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar, "Phase-shifting point-diffraction interferometry at 193 nm," Appl. Opt. 39, 5768-5772 (2000)

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  1. H. Medecki, E. Tejnil, K. A. Goldberg, J. Bokor, “Phase-shifting point diffraction interferometer,” Opt. Lett. 21, 1526–1528 (1996). [CrossRef] [PubMed]
  2. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, J. Bokor, “At-wavelength interferometry for EUV lithography,” J Vac. Sci. Technol. B 15, 2455–2461 (1997). [CrossRef]
  3. K. Goldberg, P. Naulleau, J. Bokor, “EUV interferometric measurements of diffraction-limited optics,” J. Vac. Sci. Technol. B 17, 2982–2986 (1999). [CrossRef]
  4. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, J. Bokor, “Characterization of the accuracy of EUV phase-shifting point diffraction interferometry,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE3331, 114–123 (1998). [CrossRef]
  5. P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, J. Bokor, “Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy,” Appl. Opt. 38, 7252–7263 (1999). [CrossRef]
  6. W. Linnk, “A simple interferometer to test optical systems,” Proc. Acad. Sci. USSR 1, 210–212 (1933).
  7. R. N. Smartt, W. H. Steel, “Theory and application of point diffraction interferometers,” Japan. J. Appl. Phys. 14, Suppl. 14-1, 351–356 (1975).
  8. K. Goldberg, “EUV interferometry,” Ph.D. dissertation (Department of Physics, University of California, Berkeley, Berkeley, Calif., 1997).
  9. D. Malacara, ed., Optical Shop Testing (Wiley, New York, 1992).
  10. W. G. Oldham, R. E. Schenker, “193-nm lithographic system lifetimes as limited by UV compaction,” Solid State Technol. 40, 95–102 (1997).
  11. M. Rothschild, D. J. Ehrlich, D. C. Shaver, “Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica,” Appl. Phys. Lett. 55, 1276–1278 (1989). [CrossRef]
  12. D. C. Allan, C. Smith, N. F. Borrelli, T. P. Seward, “193-nm excimer-laser-induced densification of fused silica,” Opt. Lett. 21, 1960–1962 (1996). [CrossRef] [PubMed]
  13. R. Schenker, W. G. Oldham, “Ultraviolet-induced densification in fused silica,” J. Appl. Phys. 82, 1065–1071 (1997). [CrossRef]
  14. F. Piao, R. Schenker, W. G. Oldham, “Temperature dependence of UV-induced compaction in fused silica,” in Optical Microlithography X, G. E. Fuller, ed., Proc. SPIE3051, 907–912 (1997). [CrossRef]
  15. S. Lee, F. Piao, P. Naulleau, K. Goldberg, W. Oldham, J. Bokor, “At-wavelength characterization of DUV-radiation-induced damage in fused silica,” in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, ed., Proc. SPIE3998, 724–731 (2000). [CrossRef]

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