OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5768–5772

Phase-shifting point-diffraction interferometry at 193 nm

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar  »View Author Affiliations


Applied Optics, Vol. 39, Issue 31, pp. 5768-5772 (2000)
http://dx.doi.org/10.1364/AO.39.005768


View Full Text Article

Acrobat PDF (6856 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Phase-shifting point-diffraction interferometry at the 193-nm wavelength suitable for highly accurate measurement of wave-front aberration is introduced. The interferometer preserves the advantages of the previously described extreme-ultraviolet phase-shifting point-diffraction interferometer but offers higher relative efficiency. Wave-front measurement of an imaging system, operating at the 193-nm wavelength, is reported. Direct measurement of the refractive-index change in a deep-ultraviolet radiation-damaged fused-silica sample is also presented as an application.

© 2000 Optical Society of America

OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(350.2770) Other areas of optics : Gratings

Citation
Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Fan Piao, William Oldham, and Jeffrey Bokar, "Phase-shifting point-diffraction interferometry at 193 nm," Appl. Opt. 39, 5768-5772 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-31-5768


Sort:  Author  |  Year  |  Journal  |  Reset

References

  1. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, “Phase-shifting point diffraction interferometer,” Opt. Lett. 21, 1526–1528 (1996).
  2. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, “At-wavelength interferometry for EUV lithography,” J Vac. Sci. Technol. B 15, 2455–2461 (1997).
  3. K. Goldberg, P. Naulleau, and J. Bokor, “EUV interferometric measurements of diffraction-limited optics,” J. Vac. Sci. Technol. B 17, 2982–2986 (1999).
  4. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, “Characterization of the accuracy of EUV phase-shifting point diffraction interferometry,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 114–123 (1998).
  5. P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, “Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy,” Appl. Opt. 38, 7252–7263 (1999).
  6. W. Linnk, “A simple interferometer to test optical systems,” Proc. Acad. Sci. USSR 1, 210–212 (1933).
  7. R. N. Smartt and W. H. Steel, “Theory and application of point diffraction interferometers,” Japan. J. Appl. Phys. 14, Suppl. 14–1, 351–356 (1975).
  8. K. Goldberg, “EUV interferometry,” Ph.D. dissertation (Department of Physics, University of California, Berkeley, Berkeley, Calif., 1997).
  9. D. Malacara, ed., Optical Shop Testing (Wiley, New York, 1992).
  10. W. G. Oldham and R. E. Schenker, “193-nm lithographic system lifetimes as limited by UV compaction,” Solid State Technol. 40, 95–102 (1997).
  11. M. Rothschild, D. J. Ehrlich, and D. C. Shaver, “Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica,” Appl. Phys. Lett. 55, 1276–1278 (1989).
  12. D. C. Allan, C. Smith, N. F. Borrelli, and T. P. Seward III, “193-nm excimer-laser-induced densification of fused silica,” Opt. Lett. 21, 1960–1962 (1996).
  13. R. Schenker and W. G. Oldham, “Ultraviolet-induced densification in fused silica,” J. Appl. Phys. 82, 1065–1071 (1997).
  14. F. Piao, R. Schenker, and W. G. Oldham, “Temperature dependence of UV-induced compaction in fused silica,” in Optical Microlithography X, G. E. Fuller, ed., Proc. SPIE 3051, 907–912 (1997).
  15. S. Lee, F. Piao, P. Naulleau, K. Goldberg, W. Oldham, and J. Bokor, “At-wavelength characterization of DUV-radiation-induced damage in fused silica,” in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, ed., Proc. SPIE 3998, 724–731 (2000).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited