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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5796–5800

Dispersion of the temperature dependence of the retardance in SiO2 and MgF2

Shelley M. Etzel, A. H. Rose, and C. M. Wang  »View Author Affiliations


Applied Optics, Vol. 39, Issue 31, pp. 5796-5800 (2000)
http://dx.doi.org/10.1364/AO.39.005796


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Abstract

We have directly measured the retardance versus temperature for single-crystal quartz (SiO2) and magnesium fluoride (MgF2) at wavelengths of 633, 788, 1318, and 1539 nm and over a temperature range of 24–80 °C. To our knowledge, the temperature dependence of retardance for these two materials has not been directly measured. We compared our direct measurements of the normalized temperature derivative of the retardance γ with derived values from previously reported indirect measurements and found our results to be in agreement and our measurement uncertainties to be typically a factor of 4 smaller. Our overall mean value for γSiO2 is -1.23 × 10-4 with a combined standard uncertainty of 0.02 × 10-4 and little wavelength dependence over the 633–1539-nm range. Our overall mean value for γMgF2 is -5.37 × 10-5 with a combined standard uncertainty of 0.17 × 10-5 and with a small wavelength dependence over the 633–1539-nm range.

© 2000 Optical Society of America

OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(120.6780) Instrumentation, measurement, and metrology : Temperature
(160.4760) Materials : Optical properties

History
Original Manuscript: April 17, 2000
Revised Manuscript: July 11, 2000
Published: November 1, 2000

Citation
Shelley M. Etzel, A. H. Rose, and C. M. Wang, "Dispersion of the temperature dependence of the retardance in SiO2 and MgF2," Appl. Opt. 39, 5796-5800 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-31-5796

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