Dispersion of the temperature dependence of the retardance in SiO2 and MgF2
Applied Optics, Vol. 39, Issue 31, pp. 5796-5800 (2000)
http://dx.doi.org/10.1364/AO.39.005796
Acrobat PDF (88 KB)
Abstract
We have directly measured the retardance versus temperature for single-crystal quartz (SiO2) and magnesium fluoride (MgF2) at wavelengths of 633, 788, 1318, and 1539 nm and over a temperature range of 24–80 °C. To our knowledge, the temperature dependence of retardance for these two materials has not been directly measured. We compared our direct measurements of the normalized temperature derivative of the retardance γ with derived values from previously reported indirect measurements and found our results to be in agreement and our measurement uncertainties to be typically a factor of 4 smaller. Our overall mean value for γSiO2 is −1.23 × 10−4 with a combined standard uncertainty of 0.02 × 10−4 and little wavelength dependence over the 633–1539-nm range. Our overall mean value for γMgF2 is −5.37 × 10−5 with a combined standard uncertainty of 0.17 × 10−5 and with a small wavelength dependence over the 633–1539-nm range.
© 2000 Optical Society of America
[Optical Society of America ]
OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(120.6780) Instrumentation, measurement, and metrology : Temperature
(160.4760) Materials : Optical properties
Citation
Shelley M. Etzel, A. H. Rose, and C. M. Wang, "Dispersion of the temperature dependence of the retardance in SiO2 and MgF2," Appl. Opt. 39, 5796-5800 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-31-5796
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